'/
                   United States
                   Environmental Protection
                   Agency
Water Engineering
Research Laboratory
Cincinnati OH 45268
                   Research and Development
EPA/600/S2-85/063-Aug. 1985
vxEPA         Project  Summary
                   Microprocessor-Controlled
                   Anodic  Stripping Vo I tarn meter
                   for Trace  Metal  Analysis  in
                   Tap  Water

                   R. G. Clem, F. W. Park, F. A. Kirsten, S. L Phillips, and E. P. Binnall
                     This report discusses the construc-
                   tion and  use of a portable, micro-
                   processor-controlled anodic stripping
                   voltammeter for onsite, simultaneous
                   metal analysis of copper (Cu), lead (Pb),
                   and cadmium (Cd) in tap water. The in-
                   strumental system consists of a pro-
                   grammable controller,  permits keying
                   in analytical parameters such as sparge
                   time and plating time, a rotating cell for
                   efficient oxygen removal and amalgam
                   formation, and a magnetic tape that
                   can be used for data storage. Analysis
                   time can be as short as 10 to 15 min.
                   The stripping analysis is based on a pre-
                   measurement step during which the
                   metals from a water sample are con-
                   centrated  into a thin mercury film by
                   deposition from an acetate solution of
                   pH 4.5. The concentrated metals are
                   then electrochemically dissolved from
                   the film by applying a linearly increas-
                   ing anodic potential. Typical peak-
                   shaped curves are obtained. The
                   heights of these curves are related to
                   the concentration  of metals in the
                   water by calibration data. Results of tap
                   water analysis showed 3 ± 1  (ig/L Pb,
                   22 ± 0.3 fig/L Cu, and less than 0.2 fig/L
                   Cd for a Berkeley, California, tap water.
                   For 10 samples of Seattle, Washington,
                   tap water analyses showed 1 to 1 |j.g/L
                   Cu and 1 to 2 |tg/L Pb. Recommenda-
                   tions are given for a next generation
                   instrument system.

                     This Project Summary was devel-
                   oped by EPA's Water Engineering Re-
                   search Laboratory, Cincinnati, OH, to
                   announce  key findings of the research
project that is fully documented in a
separate report of the same title (see
Project Report ordering information at
back).

Introduction
  Trace metals in public drinking water
supplies are of special concern because
of their potential long-term harmful  ef-
fects when ingested by humans. Water
supply resources for municipalities con-
tain various types and concentrations of
dissolved metals. In untreated water,
these concentrations are generally sig-
nificantly lower than the EPA Interim
Primary Drinking Water Standards. But
chemicals used in water treatment may
contain traces of metals as impurities
and may introduce them to water at the
treatment  plant. Another potential
source of metals is corrosion and disso-
lution of the metallic piping of tank inte-
riors through  which the treated water
passes or is stored before ingestion.
Thus a need exists for measuring the
concentration of dissolved metals at the
user's tap, where the water is actually
ingested.
  Although a  number  of  methods are
available for measuring trace metals in
drinking water, anodic stripping voltam-
metry (ASV) was selected for this study
because  it offers a number of advan-
tages, including (a) simultaneous analy-
ses of more than one metal, (b) sensitiv-
ity to concentrations of less than 1 M-g/L,
(c) portable instrumentation, (d) metal
speciation at ambient concentrations,
(e) easy automation, and (f) rapid analy-
ses at a relatively low cost.

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  This report describes a  portable,
microprocessor-controlled ASV system
that was constructed for the onsite anal-
ysis of Cu, Pb, and Cd in tap water (Fig-
ure 1). The  instrumental parameters
such as a sparge and plating time were
keyed into the computer, and analyses
were then done automatically. The ASV
system was applied to the  analysis of
one sample  of Berkeley, California,  tap
water and 10 samples of tap water from
Seattle, Washington.  The report dis-
cusses calibration of the instrument
with known metal  concentrations and
analyzes the results of the tap water
analyses. Selected information is given
on  (1) the anodic  stripping electro-
chemistry of Cd, Pb, and Cu;  (2) the ASV
method using mercury thin films plated
onto graphite electrodes; and (3) the in-
strumentation electronics.
Anodic Stripping Voltammetry
at Mercury Film Electrodes

  Anodic stripping is  applied  to the
analysis of ^g/L quantities of mercury-
soluble metals such as Cd and Pb using
thin films (4 to 100 jim) formed by the
deposition of mercury (Hg) onto carbon
electrodes. The Hg  is deposited  along
with metals (Cd, Pb, Cu) being analyzed.
  The first step involves electroplating,
during which the metals being deter-
mined are concentrated on the order of
100-fold in 5 min within the Hg film. This
deposition step is not exhaustive (non-
stoichiometric); only 2%  to  3% of the
total amount in the water sample is de-
posited. The applied  potential  is
stepped to a sufficiently negative value
so that the electro-deposition rate is lim-
ited only by the rate of mass transfer of
the dissolved metals from the bulk of
the solution to the electrode surface.
The solution is stirred by rotating the
cell to enhance  mass transfer. The
plated metals establish a concentration
gradient within the Hg film whereby the
concentration of metal at the electrode-
solution interface  is larger than that to-
ward the interior of the electrode.
  After a set time  (such as 5 to 10 min),
stirring is stopped and the solution be-
comes quiet. During this quiescent pe-
riod, the  concentration gradient within
the Hg film is essentially eliminated be-
cause deposition  is almost negligible,
and the plated  metals diffuse through
the film from regions of high concentra-
tions to lower concentrations. A quies-
cent time of 60 sec was used here.
  The third step is anodic stripping of
the metals from the amalgam by appli-
 Figure 1.   ASV instrument constructed by the Lawrence Berkeley Laboratory.

                                   2

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cation of a linearly increasing positive
potential. At potentials near the Nerns-
tian value  for a  particular metal, the
metal begins to dissolve (strip), giving
rise to typically peak-shaped  curves at
more positive potentials. A peak is ob-
tained for each  metal, and thus a
charge-voltage curve can consist of
more than one peak. Usually this peak
height is measured and  related to the
metal concentration in the solution by
means of calibration data. Peak areas
have also been measured.

Instrument System
Components
  The ASV system constructed  here
was designed to automate settings for
the analytical  procedure, to acquire data
relating peak  height to metal concentra-
tion in water samples, and to store data
from the analysis of tap water for subse-
quent calculations. The system consists
mainly of the following  items:  a rotating
cell containing the water sample, elec-
trodes, and inlets for the sparge gas; a
digital potentiostat for automating the
procedure; and a  pen recorder or  mag-
netic tape for data storage and calcula-
tion. The functions of these four major
components  are  described in the fol-
lowing sections and in  Table  1.

Rotating Cell
  A cylindrical rotating cell machined
from Lucite*  was used to provide both
for quick oxygen  removal during the
sparging step and for a high rate of
metal preconcentration during the
metal  deposition. Only  60 sec  is re-
quired for  effective oxygen  removal,
thereby reducing  the time required for
analysis. The  solution volume used was
generally 15 ml.
  During oxygen sparging, the cell con-
taining the  15 mL of solution  is rotated
automatically in a clockwise direction of
0.9 sec. A  counterclockwise pulse is
then imparted for a duration of 0.1 sec.
Under these  conditions,  the  dissolved
oxygen concentration is lowered suffi-
ciently so that the background current
resulting from oxygen reduction  does
not interfere  with the  analysis proce-
dure.
  Nitrogen  or other inert gas such as
carbon dioxide is introduced through
the bottom of the electrode holder at a
rate of ~5 L/min to effect sparging. At
the conclusion of the 60-sec  sparging
Table 1.    Major Functions of the ASV System Components

     Component                                   Functions
Rotating cell
Digital potentiostat
Microcomputer controller
Recorder
Contains samples and electrodes, sparges, oxygen,
  preconcentrates trace metals, and performs anodic
  stripping of amalgams.

Applies and maintains plating potential, applies anodic
  stripping ramp potential, and measures stripping
  peak heights.

Starts and stops the following: cell rotation for sparg-
  ing, cell rotation for plating, sparge and plating
  times, anodic stripping ramp; also transmits peak
  height data to cassette and strip chart recorders.

The strip chart records a background trace and records
  peak height traces. The cassette provides fast-rate
  data storage for later calculation.
'Mention of trade names or commercial products
 does not constitute endorsement or recommenda-
 tion for use.
period, the microprocessor stops cell
rotation, and the solution drains com-
pletely to the floor of the cell, because a
Lucite surface is not wetted by water.
The the agitation (stirring)  period be-
gins, during which amalgam is accumu-
lated in the preconcentration  step. A
low flow rate of nitrogen  (e.g., 1  to
2 L/min) is maintained during  the plat-
ing step to  prevent infusion of air into
the cell and, thereby, to maintain a low
background current.
  Efficient stirring is important for short
analysis times such as those used here.
Stirring is produced in the rotated cell
during plating by controlled reversals of
the direction of cell rotation every sec-
ond. The graphite working electrode is
placed on a radius of the cell and is po-
sitioned to face the cell wall. Turning the
electrode through 180° so that it faces
the center of the cell results in a marked
decrease in the rate of amalgam accu-
mulation because  of  a substantially
lowered stirring  rate. Thus the elec-
trode, once positioned and locked into
place with  the set screw,  must not be
moved until the analysis is completed.

Digital Potentiostat
  The digital potentiostat controls the
potential  between  the working elec-
trode and the reference electrode by in-
jecting and extracting pulses of charge.
In this manner, the  feedback current is
digitized. Advantages of digitized cur-
rent include the capability for direct
readout on a scalar, direct computer
compatibility, and the elimination of a
need for analog  to digital converters.
The current or integral of charge is mea-
sured by counting the number of charge
pulses over a specified period  of time
with the scalar. A schematic of the digi-
tal potentiostat appears in Figure 2.
           The circuit diagram  in Figure 2 con-
         sists of the electrochemical cell, opera-
         tional amplifier, digitalizing logics, and
         current pumps. The arrangement
         shown is used to maintain a control po-
         tential  and to  measure the current
         change digitally during  electroplating
         and stripping.  Two pumps exist  in
         series—one a 0.1 milliampere (ma) neg-
         ative  constant current  supply, and the
         other  a positive, 0.6- to 1.0-ma ad-
         justable and controllable constant cur-
         rent supply. The cell (which  is con-
         nected between the two current
         supplies to  ground) provides an alter-
         nate current path. The maximum posi-
         tive or negative voltage drop across the
         cell depends on the cell impedance and
         the current being provided by the posi-
         tive and negative source. All voltages
         between these extremes are  regulated
         by the feedback loop, which consists of
         the reference electrode, the voltage
         comparator, the J-K flip-flop, the cur-
         rent switch transistors  Q3 and Q4, and
         diode D2. When a pulse from the cur-
         rent switch forward-biases D2, the neg-
         ative  0.1 current supply  is pulling the
         cell voltage down. Since the positive
         current supply can provide an average
         of 0.3 to 0.5 ma, it will pull the cell volt-
         age up when being pulsed. The positive
         source actually is a 0.6- to 1.0-ma sup-
         ply, which is  normally sunk through
         diode D2. Only when Q4 is turned  off
         will this supply  provide current to the
         cell.
           The PULSE ON  pulses, which come
         from the J-K flip-flop,  are also output
         through Q of the same J-K to a pulse
         counter whose counting period  is
         program-selected.
           Voltage  is maintained across the cell
         by the use of one fixed 0.1-ma supply
         and one controllable  1.0-ma supply.

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both connected to the cell auxiliary elec-
trode  so that the sum of the currents
across the cell impedance will generate
the voltage called for by the systems
program. The feedback loop consists of
the reference electrode and an LM 310
(IC-4)  unity gain buffer leading to a dif-
ferential amplifier whose output goes to
an LM 311 voltage comparator.  When
the reference electrode is lower than the
voltage demanded by the program,  a
current  switch  (2  each 2N  2369)
back-biases diode D3 (1N 4148) so that
current from the 1-ma constant current
source (IC-1 and 2N 2608) is directed to
the cell auxiliary electrode. To facilitate
relative current measurement,  pulses
are injected into the cell. A 1-MHz clock
is input to a 7470 J-K flip-flop; when the
J-K is enabled by a high signal from the
LM 311 voltage comparator,  its  output
will be a 500-kHz square wave.

Microcomputer Controller
  In addition to the applied  potential,
control is  also provided for the follow-
ing functions:  time  for each  step, se-
quencing  of each step, storage  of the
                           ASV data, output of the data, and a vis-
                           ual indication of the  stripping process
                           using a strip chart recorder. This control
                           is provided by a microcomputer based
                           on an Intel 8080A 8-bit microprocessor
                           central processing unit. Changes in test
                           parameter variables are entered by the
                           operator from a 16-button keyboard on
                           the front panel of the instrument. A flow
                           chart detailing  the various controlled
                           functions appears in Figure 3.
                             The POWER ON  or SYSTEM RESET
                           buttons return all parameters to the ini-
                           tial conditions programmed for the plat-
                           ing and stripping parameters. When ei-
                           ther of  these buttons is  pressed,
                           preprogrammed values from  PROM
                           memories are set into the microproces-
                           sor. These are the following input com-
                           mands:
                             Sparge:      60 sec
                             Start:        1000 mV
                             Step:         5 mV
                             Plate:        420 sec
                             Delay:       1 msec
                             Count:       400 msec
                             Day:         0
                             Test No.:     0
  Spike A:      0
  Spike B:      0
  The MONITOR light will come ON.
Pressing any key will show the value
programmed.  For example, to see
"SPIKE", press  SPIKE and A, or SPIKE
and B. To enter  a value  of 25  for
SPIKE B, press  SPIKE,  press B, press
ENTER, press 2, press 5, press ENTER
and the change  is made. The MONITOR
light will go ON.

Data Handling
  The output signal of analytical inter-
est from the ASV is the  stripping peak
height as a function of applied potential.
For this instrument, the  stripping peak
heights were mainly measured from the
tracing on either a  strip  chart recorder
or an X-Y recorder.  Output to the strip
chart recorder is the digital-to-analog
(DAC) conversion times a scale factor of
the  counts accumulated during each
5-mV step (or other  selected  step mag-
nitude) during the stripping cycle. The
scale factor (sensitivity) of the strip
chart recording  can be chosen by the
operator as appropriate for a particular
                                                         + 72
                                                               1 ma
                    J  Q

                   >'- 2

                    K  Q
                              500KHZ Bursts
                              _nnn_nnn_
                                                                                 Aux
                                                       Sirrent
                                                       A/itch
                                                      -12
                                                                       Voltage
                                                                     Comparator
                                                                                                          0.1 ma
                       -12
                                                                                                 Volt DAC
Figure 2.
Schematic for Anodic Stripping Voltammeter.

                       4

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(initialize'}
Power
On
•
Set Run
No. To 1
• . * , ,
Aux. Relay
Open
	 .
Cell Drive
MTR 'Off
*
Ref DAC To
EndMV
I
Set Test
Parameters
PS
T
Close
>- Open
Relay


Day XXXX
Test XXXX
Ref order LSE X
Spike A XXX 1
Sparge 060 Sec
Start -1000MV
Step 5 MV Fixed
End +350 MV Program
Plate 350 Sec Values
Delay IMS
Count 400 MS
Install Cell
With
Conditioned
Sample
r
(Push Test^)

Freon Valve
To High Flow
, •
Spin Cell
0.9 Sec On
0. 1 Sec Off
*
For 60 Sec
*
Freon Valve
To Low Flow

	 ®



1
Oscillate Cell
»
Ref DAC
To Start MV
»
Aux Electrode
Relay 'On'
»
Plate For
Selected Time
»
Stop Cell
Oscillation








Strip Chart
Recorder 'On

Wait 5 Sec For
Cell Stability




Manually
	 Turn On
Freon




,



X

7

1
DAC Steps By
Selected MV
Reset &
Start CNT r-= — 7— -i
Cnunter «*„_«,.. DAC To

Holds For
Count
rlVo*"^
^H'MVs'
Stop DAC
Ramp
t
Open Aux
Electrode
Relay
*
Cell Drive
MTR 'Off
»
MAG Record
I// Parameters
And Data
»
Advance to
Next Run
[ Wait [
Enter Spike
'ype & Amour
*
Push Test
»
Stan TNT l"""<5 rKr "AM -.. .,.—.-..
stop c/v/ ^ Sfef) 1 | '"" . 1 Recorder

> Rerun Data
ToS/C
Recorder
tP.S.)



Operator adds spike of A or B solution. Type
and amount depending on peak observed on
t * chart recorder. Attempt is made to double
peak.
Repeat Of Run No. 1
Except Run 2 & 3
Plate Time is
Run 1 Time - 2
_, I
<



End Of Run 3
Completes Tes
Of A Sample
1
Advance Test
Number
»
Wait For
Next Test

t



Figure 3.    Flow chart for Anodic Stripping Voltammeter.

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measurement. Data are also  recorded
on  a  cartridge digital tape recorder,
where they are available for further off-
line processing.
  Each water analysis  is identified by
both test number and run numbers. A
complete analysis must have  three se-
quential runs. These three runs are per-
formed on: (1) the water sample; (2) the
water sample with spike A added; (3)
the water sample with spikes A and B
added. Runs 2 and 3 establish the cali-
bration of the instrument for that run.
  A sample  of tap water from the
Lawrence Berkeley Laboratory was ob-
tained by running the water for 1 to
2 min then collecting 500  ml in a
polyethylene bottle that had  been
cleaned and rinsed with the tap water.
Hydrochloric acid was added to  pH 1,
and the solution was permitted to equi-
librate for about 48 hr. The sample was
then discarded, and  an additional 500
mL was collected in the same manner.
After 48 hr, 15 mL was added to the ro-
tating cell,  and  ammonia-treated
sodium acetate was added  drop-by-
drop to achieve pH 4.7. Then 25 jo-L of
0.0025 M mercury nitrate solution was
pipetted in, and background anodic
stripping curves were obtained. Known
pi  concentrations of Cu, Pb, and Cd
standards were pipetted in, and strip-
ping curves were again obtained. The
peak  heights were  measured  on an
X - Y recorder, and the concentrations
of the three metals in the tap water were
determined by the method of standard
additions. Any Cd in the water was be-
low the limits of detectability of the pro-
cedure used. Analysis by  atomic ab-
sorption detected no Cd either. The
results obtained for Cu, Pb, and Cd were
22, 3, and  <0.2 ppb, respectively. Re-
sults obtained for 10 Seattle water sam-
ples are shown in Table 2.

Recommendations
  Based on the experience gained for
tap water analysis with the instrument
described  in  this  report,  a   next-
generation ASV might include the fol-
lowing items: (1) A  cell that incorpo-
rates  self-cleaning capabilities. Carbon
electrodes with electro-deposited mer-
cury films age with use and give both
spurious  peaks as well as increased
.background current during the stripping
step.  The result is a loss in sensitivity
and possible erroneous analyses be-
cause of peaks shown for  metals that
are otherwise not present in detectable
amounts. Currently, cleaning is done
Table 2.    Analysis of Municipal Water From Seattle, Washington
Sample Designation
NE 24 105NE
7914 NE 26
9850 Belfair Rd, Standing
9850 Belfair Rd, Running
Taylor Creek Well 7/4
Taylor Creek Well 7/13
Jones Res. Running
Jones Res. Standing
Park Place Standing, 1st run
Park Place Standing, 2nd run
AA Values
Cu Pb
1000 ppb 10 ppb
680 < 10
950 < 10
510 <10
<6 <10
<6 <10
—
—
— —
—
ASV
Cu
—
550 ppb
1100
800
2.6
1.4
12.4
1800
WOO
1000
Values
Pb
—
1.3 ppb
N.D.
N.D.*
N.D.
N.D.
2.3
N.D.*
N.D.*
N.D.*
N.D. = Not detected.
N.D.* = Non detection likely due to solid phase amalgam formation.

manually by periodically rubbing the
surface gently with filter  paper. (2)
Methods for removing large quantities
of dissolved Cu. Plated Cu interferes in
two ways:  by forming intermetallic
compounds with Cd (which reduces the
anodic peak height for Cd) and by mask-
ing the Pb and Cd  peaks. Large concen-
trations of dissolved Cu (estimated  at
>800  |ig/L) interfered in this way with
measurement of Pb and Cd in the sam-
ples of Seattle water. Cu plates  more
easily than either  Pb  or Cd, so one ap-
proach to this  problem might be a pre-
analysis step involving deposition of Cu
with a dual-working electrode system.
(3) Methods for measuring the total con-
centration of dissolved metals. Metals
can form more than one species in natu-
ral waters; some  of these species are
not measured  by ASV. A pre-ASV step
such as ozonolysis might be effective in
destroying complexes between metals
and electro-inactive  species. (4) Pro-
gramming of the  ASV system so that
the readout will be in  ^.g/L of the metals
being measured.  Currently  the output
signal is either in analog form on a strip
chart recorder or in digital form on mag-
netic tape. Both must be further pro-
cessed.
  The full report was submitted in fulfill-
ment  of  Contract  No. EPA-70-D-X0507
by the University of California under the
partial sponsorship of the U.S. Environ-
mental Protection Agency.
                                                                               ft US GOVERNMENT PRINTING OFFICE. 1985 559-111/20638

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    R. G. Clem, F. W. Park, F. A Kirsten, S. L Phillips, and E. P. Binnall are with
      University of California, Berkeley, CA 94720.
    Marvin C. Gardels is the EPA Project Officer (see below).
    The complete report, entitled "Microprocessor-Controlled Anodic Stripping
      Voltammeter for Trace Metal Analysis in Tap Water," (Order No. DE 85-002
      781; Cost: $10.00, subject to change) will be available only from:
           National Technical Information Service
           5285 Port Royal Road
           Springfield, VA 22161
           Telephone: 703-487-4650
    The EPA Project Officer can be contacted at:
           Water Engineering Research Laboratory
           U.S. Environmental Protection Agency
           Cincinnati, OH 45268
United States
Environmental Protection
Agency
Center for Environmental Research
Information
Cincinnati OH 45268
Official Business
Penalty for Private Use $300
EPA/600/S2-85/063
      0000329   PS
      U  S  ENVIR  PROTECTION  AGENCY
      REGION  5  LIBRARY
      230  S  DEARBORN STREET
      CHICAGO              It   60*04

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