540SR92080
&EPA
United States
Environmental Protection
Agency
                                                            February 1993
                           SUPERFUND INNOVATIVE
                           TECHNOLOGY EVALUATION
                               Emerging  Technology
                               Summary

                               Laser  Induced  Photochemical
                               Oxidative Destruction of Toxic
                               Organics  in  Leachates and
                               Groundwaters
                                 Organic compounds, specifically
                               chlorinated aromatic compounds and
                               unsaturated organic compounds, are
                               major contaminants in groundwater.
                               These specific species also tend to rank
                               high on the list of the U.S. Environ-
                               mental Protection Agency (EPA) prior-
                               ity pollutants, even at  the  low (mg/L)
                               concentrations that are normally found
                               In groundwater. The technology de-
                               scribed in this report has been devel-
                               oped under the Emerging Technology
                               Program  of the Superfund Innovative
                               Technology Evaluation (SITE) Program.
                               Organic compounds in wastewater are
                               photochemically oxidized by applying
                               ultraviolet (UV) radiation using an
                               excimer laser. The photochemical re-
                               action Is capable of producing the com-
                               plete mineralization of  a variety of or-
                               ganic compounds  at moderate to ex-
                               tremely low concentrations of the toxic
                               compounds in water. The energy sup-
                               plied by the laser is sufficient to stimu-
                               late photochemical reactions between
                               the organics and the hydrogen perox-
                               ide employed as a chemical oxidant,
                               causing   photooxidation  and/or
                               phototransformation of the toxic or-
                               ganic species to carbon dioxide, water,
                               and in the case of the chlorinated sol-
                               vents, the halide ion. Additionally, the
                                 radiation is not absorbed to any sig-
                                 nificant extent by the water. The pro-
                                 cess has been developed as  a  final
                                 treatment step to reduce organic con-
                                 tamination in groundwater and indus-
                                 trial wastewaters to acceptable dis-
                                 charge limits.
                                   Optimum conditions for the complete
                                 mineralization of several  different
                                 classes of compounds were developed
                                 and demonstrated In the laboratory.
                                   This summary was developed by the
                                 EPA's  Risk Reduction Engineering
                                 Laboratory, Cincinnati, OH, to announce
                                 key findings of the Emerging Technol-
                                 ogy Program that Is documented In a
                                 separate report (see Project  Report or-
                                 dering information at back).

                                 Introduction
                                   This report summarizes the results of a
                                 2-yr bench-scale evaluation of the laser
                                 induced photochemical oxidative destruc-
                                 tion (LIPOD) process sponsored by the
                                 SITE Emerging Technologies Program.
                                   The LIPOD process is based on the
                                 photochemical destruction of toxic organic
                                 chemicals in dilute aqueous solutions. En-
                                 ergy is supplied by an excimer laser and
                                 is absorbed  by the organic molecule and
                                 hydrogen peroxide, thus initiating the oxi-
                                 dation of the organic compound by the

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 hydrogen peroxide. The advantage of this
 process is that the narrow band UV radia-
 tion is preferentially absorbed by the or-
 ganic molecules and hydrogen peroxide;
 little is absorbed by the surrounding water
 molecules; and  the organic  compounds
 are completely oxidized to carbon dioxide,
 water, and the inorganic ions present.
   Unsaturated organic compounds,  and
 particularly chlorinated organics, are  ma-
 jor contaminants in groundwater at or near
 hazardous waste sites. These species also
 rank high on the EPA's list of priority  pol-
 lutants, even  at the parts per billion con-
 centrations often found in  wastewaters.
 Because of the very low concentrations,
 removal of these compounds  from these
 waters is difficult and expensive. Carbon
 adsorption and UV-hydrogen peroxide or
 ozonation are currently  used to detoxify
 these toxic wastes. The  LIPOD process
 shows promise of  excellent performance
 at a lower cost.

 Process Description
   LIPOD is a process developed to oxi-
 dize low levels of toxic organic compounds
 in contaminated waters to nontoxic spe-
 cies. The process has been under devel-
 opment for the past seven years, and its
 efficacy relies on the use of  a coherent
 electromagnetic radiation source in the UV
 portion of the spectrum to activate an exo-
 thermic process  in the  presence  of an
 oxidant so as to initiate a chain oxidation
 reaction.  The UV source is an excimer
 laser that provides a high intensity coher-
 ent energy source. The oxidant is hydro-
 gen peroxide, which is miscible with water
 in all proportions, hydroxyl radicals which
 are very powerful oxidants are produced
 when the laser beam impacts the hydro-
 gen peroxide, and sufficient oxygen and/
 or hydroxyl  radicals are formed to com-
 pletely mineralize the organic compounds.
  Unlike other UV irradiation processes in
 which  the toxic molecules must be  ex-
 posed  continually to the UV radiation with
 both hydrogen peroxide or ozone present
 as the chemical oxidants, this process re-
 quires  no ozone  and the contaminant is
 exposed to the UV  light source for only a
 very short time (< 50 sec) to  initiate the
 oxidative  chain reaction.  The  investiga-
 tions have shown that only a portion of
the fluid to be decontaminated needs to
 be exposed  to the UV radiation source in
the presence of hydrogen peroxide. This
 exposed fluid can be contacted with unex-
posed  fluid and additional hydrogen per-
oxide and the entire fluid pool will un-
dergo the chain oxidation reaction.
  A typical process flow scheme is shown
in  Figure  1. The  feed stream  containing
      Waste
      Water
                                              Initiation
                                      Decontaminated
                                         Effluent
 Figure 1.  Process flow scheme for the laser induced photochemical oxidative destruction process.
 the toxic species and the hydrogen perox-
 ide flows in a direction countercurrent to
 the laser beam in a photochemical reactor
 where the toxic compounds are irradiated.
 When oxidizing halogenated solvents, the
 reaction byproducts  are carbon dioxide,
 water, and the corresponding halide ion.

 Process Performance
   The test compounds selected for this
 project are frequently found in wastewa-
 ters and have the ability to absorb the
 energy from the wave length chosen  for
 this excimer laser; other wave lengths can
 be produced by other excimer laser beams
 to react with other compounds. The ability
 of  the process to destroy a given  toxic
 compound  is defined in terms of the per-
 cent destruction achieved.
                         C -C
 Percent destruction achieved =	^ X100
where Ch - feed toxic organic concentration

    Com " effluent toxic organic concentration

  The  UV  light initiates a chain reaction.
Part of the destruction occurs during the
initiation phase of the reaction when the
reactants are exposed to the light source
(time 0 on the following figures is after this
initiation);  and the remaining  destruction
occurs as the  reaction propagates in the
absence  of light.  Table 1  and  Figure 2
show the  destruction of six compounds
during  initiation and propagation periods.
The system was found to  be dependent
on an initiation and a propagation phase.
Limited destruction was achieved during
the photochemical initiation phase for all
compounds irradiated. Greater destruction
can  be achieved  during this phase  only
at the expense of applying greater irradia-
 tion dosage. Analysis  and observation of
 the propagation process showed that sig-
 nificant changes in  the percent destruc-
 tion after a number of days depended on
 the concentration of the toxic organic com-
 pound and of the chemical oxidant, hydro-
 gen peroxide, and the irradiation dose ap-
 plied during the initiation phase.
   Process performance results with chlo-
 robenzene as the test toxic compound are
 presented in the next several figures. The
 impact of chemical oxidant concentration
 on reaction kinetics is shown in Figure 3.
 The stoichiometric quantities of chemical
 oxidant used in typical applications  are
 minuscule, and in all cases over the range
 studied, greater than 95% destruction was
 achieved. The effect of irradiation dose
 and toxic organic concentration on  the
 rate  of destruction  in the propagation
 phase are shown in Figures 4 and 5 re-
 spectively. The system  is cost efficient,
 non-labor intensive;  reaction  byproducts
 in the effluent are nontoxic. Percent  de-
 struction achieved has in some instances
 been greater than 99%.

 Conclusions
   Laboratory scale testing of  the LIPOD
 process has shown  that the  process is
 capable of destroying 90%  or more of a
 variety of  toxic organic compounds in di-
 lute water solutions. The  effects  of  or-
 ganic concentration of the toxic compound,
 oxidant concentration, and irradiation dos-
 age have  been determined for a series of
 representative organic compounds. On the
 basis of these results, the cost of a com-
 mercial-scale process has been estimated
 and found to be  very competitive with
 existing technologies that are now  in use
for wastewater detoxification. Costs range
from $30  to $70/1000 gal treated for the
complete conversion of toxic organic com-
pounds, present  initially at the 50 ppm

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Table 1.  Destruction of Toxic Organic Compounds by Laser with H,O2 at the Stoichiometric Concentration


Compound
Benzene
Chlorobenzene
Chlorophenol
Dichloroethene
Benzidine
Phenol


Irradiation
dose, photons
per molecule
10
10
10
10
10
10
Percent
destruction
at end of
initiation
period
29
31
34
18
48
35


Propagation
time (hr)
96.0
113.5
72.0
624.0
288.0
72.0
Percent
destruction
at end of
propagation
period
91
98
>99
88
88
>99
level in the solution, to carbon dioxide and
water.

Recommendations
   Results to date suggest that the LIPOD
process  has excellent potential for effec-
tive removal of organic compounds from
wastewater and that further development
of this process  is warranted.  Treatability
studies  in  the  laboratory  using  actual
wastewater samples from hazardous waste
sites  are  needed to establish  how the
process performs on waste containing a
variety of organic compounds and inor-
ganic salts. Successful completion of these
treatability studies would lay the ground-
work for commercialization of the process.
  The full report was submitted in fulfill-
ment of Cooperative Agreement No.  CR
815330020 by Energy and Environmental
Engineering,  Inc., under the sponsorship
of the  U.S.  Environmental Protection
Agency.
1
0.8
2

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                    100
                                     20
                    HgOsfchlombenzene ratio
                      0.5 stoichiometric
                        	B	
                  40            60            80
                        Reaction Time (hr)

                     HsOg'chlorobenzene ratio
                        1.0 stoichiometric
                          —  -A-  -
                                                                                            100
                                                                                                         120
HzO&chlorobenzene ratio
   1.5 stoichiometric
     --•0	
                    SOppm feed irradiated at 10 photons/molecule

 Figure 3.  Destruction of chlorobenzene by laser. Effect of chemical oxidant (H2Cy by concentration.
               100
                80 -
                               20
            40
                                                         60          80
                                                         Reaction Time (hr)
                                                   100
        120
1 photon/molecule       3 photons/molecule
                                                                               10 photons/molecule
                                                                                   — O—
Figure 4.  Destruction of chlorobenzene by laser. Effect of number of photons/molecule of chlorobenzene.

                                                                 4
                                                                              140

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              100
          "I   80
                60
                40'
                20
                          -7©-
                    o   /
                                    200
                       Wppm chlorobenzene
                                                       _L
400                600

   Reaction Time (hr)

   20 ppm chlorobenzene
      	A	
                       H202 added at stoichiometric rate.
                      Solution was irradiated at 10 photons/molecule.

Figure 5.  Destruction of chlorobenzene by laser. Effect of chlorobenzene concentration.
                                                                                          800
                                                      1,000
                                                                                          50 ppm chlorobenzene
                                                                                             •U.S. Government Printing Office: 1993-750-071/60194

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This Project Summary was prepared by the staff of Energy and Environmental
  Engineering, Inc., Somerville, MA 02143
Ronald Lewis is the EPA Project Officer (see below).
The complete report, entitled "SITE-Emerging Technologies; Laser Induced
    Photochemical Oxidative Destruction of Toxic Organics in Leachates and
    Groundwaters," (Order No. PB93-131431/AS; Cost: $19.50, subject to
    change) will be available only from:
       National Technical Information Service
       5285 Port Royal Road
       Springfield, VA 22161
       Telephone: 703-487-4650
The EPA Project Officer can be contacted at:
       Risk Reduction Engineering Laboratory
       U.S. Environmental Protection Agency
       Cincinnati, OH 45268
 United States
 Environmental Protection Agency
 Center for Environmental Research Information
 Cincinnati, OH 45268

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 Penalty for Private Use
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   PERMIT No. G-35
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