PB84-229707
        Seattle Distribution Systea
        Corrosion Control Study.  Volume 6
        Use of a  Rotating Disc Electrode to
        Assess Copper  Corrosion
       Washington Univ.,  Seattle
        Prepared  for

        Municipal Environsontal  Research
        Cincinnati, OH,
       Aug  84
I
I
bKCZK'xm

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                                          TECHNICAL REPORT DATA
                                  (Please read Instructions on the reverse before completing)
1, REPORT NO.
    EPA-600/2-84-130
4. TITLE AND SUBTITLE
  SEATTLE  DISTRIBUTION  SYSTEM CORROSION CONTROL STUDY
  VOLUME VI - USE OF A  ROTATING  DISC  ELECTRODE  TO ASSESS
  COPPER CORROSION
               3. RECIPIENT'S ACCESSION NO.
                  PBS  A    2 29?Q?
               5. REPORT DATE

                            1 <
               S. PERFORMING ORGANIZATION CODE
 '. AUTHOR(S)

 Ronald D.  Hilburn
                                                                       8. PERFORMING ORGANIZATION REPORT NO.
9. rERFORMING ORGANIZATION NAME AND ADDRESS
 Department of  Civil Engineering
 University of  Washington
 Seattle,  Washington 98195
                                                                       10. PROGRAM ELEMENT NO.
                11. CONTRACT/GRANT NO.
                                                                          R806686010
12. SPONSORING AGENCY NAME AMD ADDRESS
  Municipal Environmental Research Laboratory-Cinti.,  OH
  Office of Research and  Development
  U.S.  Environmental Protection Agency
  Cincinnati, OH 45268
                                                                       13. TYPE OF REPORT AND PERIOD COVERED
                14. SPONSORING AGENCY CODE
                  EPA/600/14
tS. SUPPLEMENTARY NOTES
  Project Officer:   Marvin. C.  Gardels  (513684-7236
16. ABSTRACT
               ,  The UBii'oFB corrceion  of coppar tubing used for transport of  Tolt River water  IB
            characterised in this study as a heterogeneous rate procesa coapoeiai of ostal oxidation
            ao/i ozide fila growth,  Interred si cheaic.il reactions, and cssss transport in the  liquid
            phnee.  Quantitative rate expressions were developed to characterize eecb of these  rate
            processes.  Exr^ric^ttte derignefi to sesaure the temperature snd pi: •Uepc^deiice of  corrosion
            under rete control  by each  process vere  conducted using steady-BCate electrochemical
            f.cchfjiq-jus.  T&e persistent and unexpected influence of solution transport of a reaction
            produce, preaueed to be OH~, complicated characterisation end identification of undtr-
            lylng rate procesa.  burfoce pH could be characterized enplrically as a function  of
            (solution temperature, pH, nnd diffusion  layer thickness.
                 this euplrical correlation for surface pH along with solution BS.BS trsn»r-ort taodels
            developed for turbultnt and laainar pipe flou vere combined to form a steady-stnte  pipe
            flow  ssodel for uniform  copper corrosion. Predictions nade using the raoiel under  stagnant
            sincl low flow rate conditions show a stable ond lou corrosion rate  of 0.2 ails per year
            (MPY) In uster of pH >  6.0.  At loaer pK, ptcilicted rates ore substantially increased
            us llie pK id reduced one! teusperature is  Increased.  At hJjh flov rates, treoer-doua
            acceleration of corrosion rate occurs, which a^aiu lacraaaeb with  increasing ceisperature
            and decreasing pH.   Only »t pH > 8.0 sre the 
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                                                EPA-600/2-84-130
                                                August 1984
SEATTLE DISTRIBUTION SYSTEM CORROSION CONTROL STUDY

   Volume VI,  Use of a Rotating Disc Electrode
            to Assess Copper Corrosion
                        by

                 Ronald D. Hilburn
          Department of Civil Engineering
             University of Washington
            Seattle, Washington  98195
      Cooperative Agreement No. R 806686 010
                  Project Officer

                 Marvin C. Gardels
         Drinking Water Research Division
    Municipal Environmental Research Laboratory
              Cincinnati, Ohio  45253
    MUNICIPAL ENVIRONMENTAL RESEARCH LABORATORY
        OFFICE OF RESEARCH AND DEVELOPMENT
       U.S. ENVIRONMENTAL PROJECTION AGENCY
              CINCINNATI, OHIO  45268

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                                  DISCLAIMER
     Although the information described  in this article has been funded
wholly or in part by the United States tnvironmental Protection Agency
through assistance agreement number R 806686 010 to Seattle Water Department,
it has not been subjected to the Agency's required peer and administrative
review and therefore does not necessarily reflect the views of the Agency and
no official endorsement should be  inferred.

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                                   FOREWORD
     The U.S. Environmental Protection Agency was created because of
increasing public and government concern about the dangers of pollution to
the health and welfare of the American people.  Noxious air, foul water, and
spoiled land are tragic testimonies to the deterioration of our natural
environment.  The complexity of that environment and the interplay of its
components require a concentrated and integrated attack on the problem.

     Research and development is that necessary first step in problem solu-
tion, and it involves defining the problem, measuring its impact, and search-
ing for solutions.  The Municipal Environmental Research Laboratory develops
new and improved technology and systems to prevent, treat, and manage waste-
water and solid and hazardous waste pollutant discharges from municipal and
community sources, to preserve and treat public drinking water supplies, and
to minimize the adverse economic, social, health, and aesthetic effects of
pollution.  This publication is one of the products of that research and is a
most vital communications link between the researcher and the user community.

     This report presents the results and conclusions from studies dealing
with the effects of flow, temperature, and chemical composition of Tolt River
water on copper corrosion.  The data support the conclusion that substantial
corrosion reduction can be achieved by raising the pH to a value above 8.0.

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                                   ABSTRACT


     The uniform corrosion of copper tubing used for cold water transport has
been characterized as a heterogeneous rate process composed of metal  oxida-
tion and oxide film growth, '.nterfacial chemical reactions, and mass  trans-
port in the liquid phase.  Quantitative rate expressions were developed to
characterize each of these rate processes.  Experiments designed to measure
the temperature and pH-dependence of corrosion under rate control  by  each
process were conducted using steady-state electrochemical techniques.  The
persistent and unexpected influence of solution mass transport of  a reaction
product (presumed to be OH") complicated characterization and identification
of underlying rate processes.  .Surface pH could be empirically characterized
as a function of solution temperature, pH, and diffusion-layer thickness.

     This empirical correlation for surface pH along with solution mass
transport models developed for turbulent and laminar pipe flow were combined
to form a steady-state pipe flow model for uniform copper corrosion.   Predic-
tions made using the model under stagnant and low-flowrate conditions show a
stable and low corrosion rate of 0.2 mils per year in water of pK  > 6.0.  At
lower pH, predicted rates are substantially increased as pH is reduced and
temperature is increased.  At high flowrates, tremendous acceleration of cor-
rosion rate occurs which again increases with increasing temperature  and
decreasing pH.  Only at pH > 8.0 are the dramatic pH and temperature  effects
dissipated so that the rate is stabilized at a minimum value of approximately
0.2 mils per year.

     Steady-state electrochemical techniques have been shown to give  rapid,
reliable, and reproducible corrosion rate measurements and to provide the
versatility necessary for quantitative characterization of a heterogeneous
rate process such as aqueous copper corrosion.

     This report was submited in the fulfillment of Contract No. R 806686 010
by the Seattle Water Department under the sponsorship of the U.S.  Environ-
mental Protection Agency.  This report covers the period June, 1979 to March,
1983, and work was completed as of March, 1983.
                                     TV

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                                   CONTENTS
                                                                         Page

Foreword	         Ill
Abstract 	,	          i v
Figures	          vi
Tables 	           x
Abbreviations and Symbols	         xii

     1.  Introduction	           1
     2.  Conclusions	           5
     3.  Recommendations	           7
     4.  Uniform Copper Corrosion:  A Heterogeneous Rate Process            8
     5.  Experimental Procedures  	,	          61
     6.  Experimental Results and Analysis 	         100
     7.  Proposed Steady-State Pipe Flow Model for Uniform
         Copper Corrosion	         168

References	         184

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                                   FIGURES


Number                                 i                                  Page

   1      Duplex Oxide Film Formed in Aqueous Copper Corrosion 	      10

   2      Simplified Copper/Oxide/Water System 	      14

   3      Chemical Reactions Involved in Aqueous Copper Corrosion ....      14

   4      Temperature and Film Thickness Dependence of Electron
          Transport Mechanism .„	.-	     29

   5      Cylindrical Coordinate System	»	     56

   6      Parabolic Velocity Distribution Characteristic of
          Laminar Pipe Flow	     56

   7      Levich Model for Turbulent Pipe Flow	      47

   8      Surface Roughness, Velocity, and Concentration Profiles in
          Turbulent Flow	    53

   9      Copper Corrosion Rate Versus Pipe Flow Reynolds Number
          from Cornet et al. (37)	    55

  10      Mass Transport Dependence of Copper Corrosion in Nitric Acid
          from Frank-Kamenetskeii et al. (38)	    56

  11      Mass Transport Dependence of Copper Corrosion in Neutral
          Solutions from Roberts and Schemilt (39)	    57

  12      Corrosion Rate of Copper in H?SO. Versus Hydrogen Ion
          Concentration Under Varied Conditions of Kate Control
          from Zembura (40) 	    57

  13      Metal/Solution System for Experiments Designed to be
          Under Kinetic Rate Control .,	    63

  14      Metal/Oxide/Solution System for Experiments Designed to
         'Be Under Solution Transport Rate Control 	    64

  15      Metal/Solution System for Experiments Designed to Be
          Under Solution Transport Rate Control	    65


                                     vi

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FIGURES - Continued

  16      Polarization Curve 	,   69
  17      Diffusion Controlled Cathodic Half-Cell 	   70
  18      Diffusion Controlled Anodic Half-Cell  	   71
  19      Three-Point Method for Calculating Corrosion Rate Under
          Kinetic Rate Control 	   74
  20      Three-Point Method for Calculating Corrosion Rate Under
          Transport Control by Anodic Reaction 	   76
  21      Three-Point Method for Calculating Corrosion Rate Under
          Transport Control by Cathodic Reaction	.	   79
  22      Basic Electrochemical Cell for Corrosion Rate Measurements ...   80
  23      Experimental Apparatus Used in this Study	   81
  24      Electrochemical Cell Used in this Study 	   82
  25      Rotator for Rotating Disc Electrode	   84
  26      Rotating Copper Disc Electrode		   84
  27      Solution IR Drop	   87
  28      Variability in Three-Point Method	   94
  29      Test Tube Containing Weight Loss Coupon	   97
  30      Weight Loss Test  Apparatus 	   97
  31      Weight Loss Test  Results 	   99
  32      Frank-Kamenetskii Plot for Data Taken  in Heterogeneous
          Systems 	  103
  33      Frank-Kamenetskii Plot of Kinetic Data at 25°C	  113
  34      Frank-Kamenetskii Plot of Kinetic Data at 15°C	  115
  35      Frank-Kamenetskii Plot of Kinetic Data at 5°C 	  119
  36      Kinetic Data of Region I at 25°C			  120
  37      Comparison of Region I Results with All Kinetic Data
          at 25°C	  124

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FIGURES - Continued

  38      Kinetic Data of Region II at 25° C 	  126
  39      Kinetic Data of Region III at 25° C 	  128
  40      Kinetic Data of Region III at 15°C and 5° C 	  129
  41      Electrode/solution Interface in Experiments Designed for
          Oxide Film Growth Rate Control	  133
  42      Frank-Kamenetskii Plot of Oxide Film Growth Data at 25°C 	   42
  43      Frank-Kamenetskii Plot of Oxide Film Growth Data at 15°C 	  138
  44      Frank-Kamenetskii Plot of Oxide Film Growth Data at 5°C 	  139
  45      Oxide Film Growth Data at 25°C 	  141
  46      Oxide Film Growth Data at 15°C	  142
  47      Oxide Film Growth Data at 5°C	  143
  48      Electrode/solution Interface in Experiments Designed for
          Stagnant Diffusion Rate Control	  144
  49      Frank-Kamenetskii Plot of Stagnant Diffusion Data at 25°C ....  151
  50      Frank-Kamenetskii Plot t-f Stagnant Diffusion Data at 15°C ....  152
  51      Frank-Kamenetskii Plot of Stagnant Diffusion Data at 5°C .....  153
  52      Stagnant Diffusion Data at 25°C	..t....  156
  53      Stagnant Diffusion Data at 15°C	..,	  157
  54      Stagnant Diffusion Data at 5°C	  158
  55      Comparison of Corrosion Rates Measured with and Without
          Oxide Film at 25°C	  160
  56      Comparison of Corrosion Rates Measured with and Without
          Solution Mass Transport Effects at 25°C		  161
  57      Comparison of Surface pH Values Calculated from Data with
          Those Predicted by Empirical Expression for Surface pH
          at 25°C				  164
  58      Comparison of Surface pH Values Calculated from Data with
          Those Predicted by Empirical Expression for Surface pH
          at 15°C	  165
                                     vili

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FIGURES - Continued
  59      Comparison of Surface pH Values Calculated from Data with
          Those Predicted by Empirical Expression for Surface pH
          at 5°C 	   166

  60      Corrosion Rate Estimates for 1/2 inch Copper Tubing at
          Varied Flowrate and 25°C 	   175

  61      Corrosion Rate Estimates for 1/2 inch Copper Tubing at
          Varied Flowrate and 15°C 	   176

  62      Corrosion Rate Estimates for 1/2 Inch Copper Tubing at
          Varied Flowrate and 5°C	   177

  63      pH Dependence of Corrosion Rates Estimated for Laminar
          Flow Conditions 	'.	   178

  64      pH Dependence of Corrosion Rates Estimated for Turbulent
          Flow Conditions 	   179

  65      Comparison of Copper Corrosion Rates Predicted by Pipe Flow
          Model with Rates Measured by Independent Sources 	   183
                                      ix

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TABLES
umber
1
2

3

4

5

6
7

8
9
10
11
12
13
14
15
16
17
18
*

Summary of Rate Expressions for Interfacial Reaction Rate
Control 	 	 	
Summary of Rate Expressions for Oxide Film Growth and

Mass Transfer to Stationary Electrodes in Quiescent
Solutions . .«„ 	 ... 	 	 	 .. 	 	
Sumnary of Rate Expressions for Solution Mass Transport
Rate Control 	 	 	 	 	 	
Syntteetic Tolt Composition 	 	 	
Corrosion Rate of Copper in Synthetic Tolt River Water,
Electrochemical Measurements 	 	 	 	 	 	
Summary of Data Analysis Methodology 	 	 	 	
Kinetic Rate Control Data: 25CC 	 	 	 	 	
Kinetic Rate Control Data: 15°C 	 <,.... 	
Kinetic Rate Control Data: 5CC 	 	 	
Region I Dat*: 25°C 	 , 	 	
Region II Data: 25°C 	 	 	 	 	 	 	
Regie® III Data: 25"C, 15°C, and 5°C 	 	
Oxide Film Growth Rate Control Data: 25°C 	 „ 	
Oxide Film Growth Rate Control Data: 15°C ., 	 	 	
Oxide Film Growth Rate Control Data: 5°C .. .» 	 	 	
Regression Results for Oxloe Film Growth Data 	 	
Page
16

25

36

49

60
89

95
109
111
136
117
121
123
127
134
135
136
140

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TABLES - Continued

 19     Parameter Estimates Calculated for Oxide Film Growth Data ...      140
 20     Stagnant Diffusion Data:  25°C	      146
 21     Stagnant Diffusion Data:  15°C 	      147
 22     Stagnant Diffusion Data:  5°C	.	      148
 23     Regression Results for Stagnant Diffusion Data 	      149
 24     Calculated Diagnostic Parameters for Diffusion Rate Control        149
 25     Null Hypothesis Testing Results	      154
 26     Parameter Estimates Calculated for StagnantDiffusion Data ...      155
 27     Pipe Flow Model Parameter Values	      171
 28     Oata for Verification of Pipe Flow Model Regression Results       181
                                      XI

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                                   SYMBOLS
                                        o
a          Lattice parameter  (approx.  2A  for  Cu^O)
ba, be     Anodic and cathodic Tafel slopes (mv)
c          Concentration of point  defects in  oxide  (cnf  ), or of a chemical
           species in solution (mole/ cm )
Cu []      Copper cation vacancy within oxide (ionic vacancy defect)
Cu(M)      Metallic copper
D          Diffusion coefficient (cm2/sec)
d          Pipe  diameter (cm)
E          E'lectrode potential (mv vs.  SCE)
E          Corrosion potential (mv vs.  SCE)
E          Electrostatic field strength in  oxide  film
e"         Electron
e          Rough surface protrusion  height  (cm)
e          Elementary electronic charge (1.60219  x  10    cone.)
F          Faraday constant (96 „ 485 cone.)
h          Plank constant  (6.62618 x 10~34  J-sec)
•fa          Plank constant divided  by 2ir
o
h          Electron hole in oxide  (electronic vacancy defect)
                                 2
 i           Current  density  (
 J1          Ionic  defect  particle  current  within  oxide film
 Je          Electronic  defect  particle  current  within oxide film
 K           Equilibrium constant
 k           Ion  product of water
 W
 k(E)        Potential dependent rate  constant for electron transfer reaction
 kf          Rate- constant for  forward reaction
 kp          Rate constant for  reverse reaction
 k           Boltzmann constant (1.38066 x  10~23 J/°k)
                                     o
 L           Thickness of  oxide film  (A)
 L           Distance down axial length  of  pipe  from  inlet  (cm)
                                       xi i

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SYMBOLS - Continued
^Cu        Completely  charged  balanced copper atom within oxide
m          Effective electron  mass
                               P
N          Molar flux  (moles cm sec)
P          Partial  pressure of dissolved 02 in  liquid phase
q.:         Io;ic defect  charge (Z-e)
qfi         Electronic  defect charge  (e)
R          Rate of  reaction, in bulk (moles/cm, sec), on surface
                    2
           (moles/cm   sec)
R          Molar gas constant  (8.31441 J/mole °K)
r          Radial distance  variable  in cylindrical coordinates
R          Pipe radius (cm)
Re         Reynolds number
Sc         Schmidt  number
T          Absolute temperature  (°K)
t          Transport number
u          Ionic mobility in electrostatic field
v          Field velocity (cm/sec)
•J          Zero field  energy barrier within oxide  (ev).
XQ         Work function at metal/oxide  interface  (ev)
X,         Work function at oxide/solution interface  (ev.)
X          Distance variable cartesian coordinates
Y          Axial distance variable  in cylindrical  coordinate?
Z          Integer  charge on charged defects and solution species
A          Ionic equivalent conductance
CM         hydrodynamic  boundary  layer thickness (cm)
£D         Diffusion layer  thickness (cm)
^         Kinematic viscosity of solution (cm9/sec)
                                           -1
Y/         Ionic defect  jump frequency  (sec   )
v          Viscosity (c  )
0          Electrostatic potential  (v)
j6          Angular  distance variable cylindrical coordinates
           Rotation speed of rotating disc electrode  (rad./sec)
                                      xi i i

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SYMBOLS - Continued
Many of the symbols used contain subscripts for descriptive purposes  or  to

refer to location.  The following descriptive subscripts are used:

      1     chemical species
      cor   corrosion
      re    reduction
      ox    oxidation                        '

The following location subscripts are used:

      S     oxide/solution interfacial region
      B     bulk solution

Other symbols used  are defined in the text.
                                       xiv

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                                ACKNOWLEDGMENTS


     I wish to thank and acknowledge the efforts of my supervisory committee:
Professor John F. Ferguson, Chairman; Professor Brian Mar; Associate Professor
Dimitris SpyKdakis; Assistant Professor Mark Benjamin; and Professor James
Murray, Graduate Faculty Representative, who read and provided helpful  com-
ments on the manuscript.

     Special thanks to Karen Nakhjiri for her careful assistance in performing
many laboratory experiments.  I gratefully acknowledge Marvin Gardels of the
U.S. Environmental Protection Agency, and Carlos Herrera and Brian Hoyt of the
Seattle Water Department Water Quality Lab for their continued interest and
support throughout the study.  Thanks also to Jane Lybecker for her help in
the typing of this manuscript.

     This research was partly funded by a grant from the U.S. Environmental
Protection Agency and supplemented by support from the Department of Civil
Engineering of the University of Washington for purchase of some needed equip-
ment.
                                      xv

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                                   SECTION I
                                 INTRODUCTION

     Corrosion of materials used to transport drinking water is both a public
health concern and an enormous economic problem.  For decades, water utili-
ties, homeowners, and commercial building users h:ve observed and responded to
its adverse effects.  Identifying the effects more clearly has led to
increased understanding of the adverse impacts and a greater appreciation of
the enormity of the problem.
     A recent national survey conducted for the U.S. Congress by the National
Bureau of Standards (1) and Battelle Columbus Laboratories (2) attempted to
quantify the total economic impact of metallic corrosion in the United States.
The estimated total cost in 1975 for industrial, corrmercial, and public estab-
lishments was $82 billion.  This figure included monies spent to replace
deteriorated parts and equipment, to maintain and repair, and to control
corrosion directly.   In the drinking water field, costs as high as $375
million/year have been estimated (3) for replacement parts and repair of
distribution systems transmitting corrosive water, with an additional  cost of
$27 million/year to treat water (3) for corrosion control.  Current costs are
likely to be even higher.  Furthermore, the Seattle Water Department has esti-
mated that repair costs for consumer plumbing systems are 10 to 20 times
higher than those associated with the distribution system.  Annual expendi-
tures of  500,000 for corrosion control are estimated to reduce consumer costs
by $2 million.
     The drinking water cycle (which includes the raw water source, treatment
processes, and water distribution system) is subject to contamination and
water quality degradation in any of its phases.  The impact of corrosion is
especially important because it occurs in the distribution system — the part
of the cycle closest to the point of customer use.  Water quality degradation

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and contamination occur because of the release of metal cations and other
corrosion products into the water.
     Public health concerns include ingestion and bodily accumulation of metal
cations from drinking water.  Maximum contaminant 'levels for many potentially
toxic chemical species have been set according to National Interim Primary
Drinking Water Regulations.  Dissolved lead and cadmium are the two most
likely contaminants to be present in excess of standards because of aqueous
corrosion (3,5,7) in plumbing systems using galvanized steel or copper tubing
with lead/tin solder.
     The aesthetic impacts  (4,6,8) often occur because of the leachinj of
copper, iron, zinc, and manganese from corroding pipelines.  Their effect is
to render the water undesirable for drinking because of unpleasant taste and
visual characteristics, and to promote staining of porcelain bathroom and
kitchen fixtures.  The current National Secondary Drinking Water Regulations
suggest maximum concentration limits on chemical species that cause adverse
aesthetic effects.
     All of these effects arise from a chemical reaction between the material
and a chemical component of the transported natural water.  In this reaction,
the structural material (a metal) is oxidized and dissolved while some
component in  solution is reduced.  So the overall process is an oxidation-
reduction reaction between  the metal and a component of the solution.  As the
reaction proceeds, the metal is thinned, yielding a shortened useful lifetime,
the length of which depends on the rate of the overall reaction.  Chemical
species produced by this reaction are principally dissolved metal cations,
some of which have maximum  concentration limits for aesthetic and health
reasons.  Reaction products may also promote precipitation of solids, which
accumulate on the metal surface and in some cases reduce water pressure and
pipeline carrying capacity  (8).  Corrosion control efforts are then aimed at
slowing down the reaction to an acceptable rate or stopping it completely
without creating further ecological or water quality problems.
     Aqueous copper corrosion is a complex system of coupled chemical anu
physical processes that involve reactions between a solid and aqueous-phase
components producing reaction products that are both solid and aqueous
species.  For the reaction to proceed, aqueous phase reactants must move
through solution to the solid/liquid interface, which  is the reaction site.

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Here surface interactions occur involving adsorption of aqueous species,
electron transfer, and formation of reaction products.  Solid phase reaction
products accumulate on the surface, and aqueous phase products are transported
to bulk solution.
     The overall corrosion process involves the transport of reacting species
in solution, chemical reaction at the solid/solution interface, and transport
of aqueous phase reaction products ciway from the interface to bulk solution.
The rate at which each of these processes proceeds affects the overall
corrosion rate.
     Rigorous study of a process as complex as aqueous copper corrosion is
indeed a multidisciplinary effort.  Principles taken from solid-state,
electrochemical, and  corrosion sciences must be combined with those of water
chemistry and environmental engineering to describe and understand adequately
the overall process as a composite of fundamental rate processes.  Though
coupled together, each component rate process is influenced by a distinct set
of environmental variables that affects the rate at which it proceeds.  The
overall corrosion rate depends at least partially on the rates of these
component processes.  The main thrust of this work, then, is to present an
overview of copper corrosion  in drinking water as a composite of several
fundamental rate processes and through laboratory experiments to determine
which rate processes  exert the greatest rate controlling Influence on the
overall process.  The environmental variables most important in influencing
the rate-controlling  processes are also evaluated.
     Standard steady-state electrochemical techniques, augumented with special
instrumentation necessary for measurement in natural waters of low conducti-
vity, were used to measure corrosion rate.  Measurements were made under
differing conditions  of rate  control to evaluate the dependence of component
processes on temperature, fluid motion, and chemical composition of the
system.
     Specifically, the goals  of this sttrdy were as follows:
     1.   To characterize as  comprehensively as possible aqueous
          copper corrosion as a heterogeneous rate process by
          bringing together principles from various disciplines to
          develop quantitative rate expressions for each of the
          component rate processes involved.

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2.   To demonstrate the utility of steady-state electrochemical
     techniques as a laboratory tool for the study of corrosion
     in drinking water systems.
3.   To determine experimentally which rate processes are most
     important in controlling the overall rate of uniform copper
     corrosion.
4.   To determine which environmental variables exert the
     greatest influence on the corrosion rate in natural waters
     of composition similar to that of the Tolt River.
5.   To demonstrate the applicability of experimental results in
     the development of a steady-state model for copper cor-
     rosion in pipe flow.

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                                  SECTION II
                                  CONCLUSIONS

INTRODUCTION
     The results and major conclusions of the research are summarized and
reviewed in this chapter in light of the objectives listed in Section I.
Suggestions are presented for future studies to resolve some of the questions
raised by this work.

SUMMARY
     Aqueous copper corrosion has been characterized as a heterogeneous  rate
process composed of metal oxidation, oxide film growth, interfacial  chemical
reactions, and mass transport in the liquid phase.   Quantitative rate
expressions were developed in Section 4 to characterize each of these rate
processes.  The experiments conducted were designed to measure the temperature
and pH dependence'of corrosion under rate control  by each of these processes.
The persistent and unexpected influence of solution mass transport of a
reaction product, presumed to be OH", complicated characterization and identi-
fication of underlying rate processes.  It was possible to empirically
characterize surface pH, pH , as a function of solution temperature, pH,  and
diffusion-layer thickness.
     This empirical correlation for pH , along with solution mass transport
models developed for turbulent and laminar pipe flow were combined to form a
steady-state pipe flow model  for uniform copper corrosion.  Predictions  made
using the model under stagnant or low flowrate conditions show a stable  and
low (0.20 MPY) corrosion rate in water of pHg > 6.0.  For pH £ 6.0, predicted
rates are substantially increased as pHg is reduced and temperature is
increased. At high flowrates, tremendous acceleration of corrosion rate
occurs, which again increases with increasing temperature and decreasing pHR.
Only above a pHR of about 8.0 are the dramatic pHR and temperature effects

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dissipated so that the rate is stabilized at a minimum value of approximately
0.2 MPY.

CONCLUSIONS
     Based on this work, the following conclusions were drawn:
     1.   Over the pH range 6.0 to 3.5, the rate of copper corrosion is
          reduced as pH is increased.
     2.   Over the temperature range of 5°C to 25°C, the rate of copper
          corrosion is reduced as temperature is reduced.
     3.   The presence of a Cu~0 film on the copper surface reduces the
          corrosion rate at all pH and temperature values studied.
     4.   The transport of a reaction product (presumed to be OH~)  away from
          the oxide/solution interface is the principal process controlling
          the overall corrosion rate.  At low pH (6.0), rate control by mass
          transport is nearly complete.  At higher pH values (>8.0), the
          influence of the underlying rate process exerts a greater influence
          on the overall rate.
     5.   In pipe flow under stagnant or low flowrate (laminar flow)
          conditions, the corrosion  rate of copper is stabilized, for pHg >
          6,0, at a value of 0.2 MPY.  Only when the pH is reduced  below 6.0
          do the accelerating effects of low pH and high temperature manifest
          themselves.
     6.   At high (turbulent) flowrates in pipe flow, corrosion rates are
          accelerated dramatically with reduced pH and increased tenperature.
          Under these conditions, only at pHg > 8.0 is the corrosion rate
          stabilized to an acceptably low value of 0.2 MPY.
     7.   The use of steady-state electrochemical techniques have been shown
          to give reliable and reproducible corrosion rate measurements even
          in watsr of low conductivity.  In addition, they provide  the ver-
          satility needed for experimental design of adequate sophistication
          to produce data that can be used in mechanism determination and
          model development.  These  qualities greatly enhance the research
          capabilities of the experimenter.

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                                 SECTION III
                               RECOMMENDATIONS

     Based on the results of this study, recommendations regarding additional
research are presented in.the areas of aqueous corrosion science, aqueous
copper corrosion, and expanded use of electrochemical  techniques.
     The ability to characterize complex metal/oxide/solution systems as
heterogeneous rate processes seems to be an important  step in determining the
dependence of the corrosion rate on system variables.   Bringing together
appropriate multidiscipHnary information to develop quantitative rate
expressions for processes Involved in the general corrosion of metals other
than copper used in the transport of drinking water is suggested as crucial
to the development of aqueous corrosion science.
     Extension and refinement of the model presented for aqueous copper cor-
rosion is also suggested.  Extension to a broader range of aqueous species
and concentrations to include species Involved in water treatment processes
such as chlorination seems advisable.  Further sophistication in mathematic-
ally modeling the oxide/solution interfacial interactions controlling the
solution pH just next to the interface is also in order, along with precipl-
                                            2$
tation studies involving the injection of Cu   and OH   into a volume of water
of known chemical composition simulating the effect of the corrosion process
In the solution adjacent to the oxide/solution interface.  The effect of
precipitated hydroxide end carbonate solids in altering the corrosion rate by
depositing on the metal surface could then be evaluated.
     We reconwend that the steady-state methods used here be further applied
to the study of other matal/oxide/solution systems.  Testing and development
1s recosmended for transient electrochemical techniques such as the A.C.
Impedance method, which because of Its possibility for Instantaneous measure-
ment can provide invaluable insight into understanding of the coupled rate
processes involved in aqueous corrosion.

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                                  SECTION IV
           UNIFORM COPPER CORROSION:  A HETEROGENEOUS RATE PROCESS

INTRODUCTION
     To quantitatively model a chemically reacting systen as complex as
copper corrosion in drinking water it is necessary to:  1) break down the
overall system into its fundamental component processes;  2) identify, evalu-
ate, and quantify mechanisms for each component process; anJ 3) combine the
rate expressions derived for each component process to formulate a rate
expression for the overall process.  The result 1s an ability to r,how to what
extent variables affecting each of the component processes influence Ihe rate
of the overall process.  Of interest in this study are the effects of chem-
ical composition of the water as well as physical variables Involved in p
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AQUEOUS COPPER CORROSION:  A QUALITATIVE: OVERVIEW
     In aqueous systems corrosion  involves an oxidation-reduction reaction
between the nwtal and an oxidiring agent in solution.  In the oxidation
half-cell the metal is oxidized from the zero to the +1, +2, or +3 oxidation
state. At near neutral pH values the reduction half-cell gcnarally involves
molecular oxygen reduction from the zero to the -2 cxidat
-------
       COPPER

         Cu
CUPROUS
OXIDE
 Cu-,0
    u
J±3
AQUEOUS SOLUTION
MIXED OXIDES
(Cu20,Cu(OH)2,CuO)
Figure 1.  Metal/Oxide/Solution  System for General Copper Corrosion  in  Aqueous
          Media.
     a)   copper dissolution
     b)   cuprous oxide film  growth
     c)   cuprous oxide dissolution
     d)   molecular oxygen reduction
The oxidation half-cell  involves  several steps, not all  of which  are  electron
transfer reactions.   In  the  first step, copper is oxidized at the metal/oxide
interface forming copper cations  in the film and producing electrons:
          Cu	> Cu  + e~    (Copper  Dissolution)                        (1)
Cations, Cu • , created in this  step are transported to the oxide/solution
interface where they react with water  to form new cuprous oxide.
          Cu*1 + 1/2 H20	>  1/2 Cu20 + H+   (Film Growth)               (2)
The oxide film grows from its  outer edge into solution until  a steady state
thickness is reached. Oxide then begins to spawl and break up into  solution,
and an outer porous  layer of mixed oxides  is formed.  Cuprous oxide  dissolves
by reacting with hydrogen ion  in  solution  as follows:
          1/2 Cu20 + H+  	> Cu2+ + 1/2 H20 + e"   (Film Dissolution)      (3)
                                      10

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Corrosion proceeds via a film growth mechanism since the underlying layer of
film is being continuously regenerated and maintained at roughly a constant
thickness despite dissolution and break up of its outer regions due to mech-
anical  strains and chemical oxidation.
     Molecular oxygen reduction  is the principal reduction half-cell For
copper corrosion at near neutral pH values.  This reaction has been widely
studied and comprehensive works  by Hoare  (5), Damjanovic (6, 7), and Yeager
(8) show that the reaction proceeds through intermediate formation of
hydrogen peroxide in acidic solutions.
          02 + 2 H+ + 2 e~ 	>  H202                                      (4)
          H202 + 2 H+ + 2 e"	> 2 H20                                   (5)
     02 is adsorbed from solution onto the oxide surface, followed by disso-
ciation and acceptance of electrons forming two 0~.  species for each (L
adsorbed.  0" .  sites are then protonated, forming surface bound H,,0?. At
this point the H?0? may either desorb and go into solution as an aqueous
                                                 +
species, or be reduced by further reaction with H  to form water.  Both of
these pathways have been reported, although a recent treatment by Smyrl (9)
suggests that only reaction (4)  is involved, and virtually all H202 enters
solution as an aqueous species.  There it may react with other solution
components, but it no longer participates in the reduction half-cell for
copper corrosion.
     In alkaline solution, a slightly different reaction occurs.  It has been
characterized by the following stoichiornetry:
          02 + 2 H20 + 4 e" 	> 4 OH"                                    (6)
Here 02 still adsorbs to the oxide surface, accepts electrons, dissociates
forming two 0~d  species.  But due to the high pH or low H+ availability in
solution, protons are acquired from water molecules with the formation of
hydroxyl ions.
     Regardless of the mechanism, CL reduction requires acceptance of elec-
trons donated by the oxide film.  The source of available electrons are the
reactions composing the oxidation half-cell.  At least half of these elec-
trons are generated at the metal/oxide interface by the copper dissolution
reaction. Since molecular oxygen is reduced at the oxide/solution interface

                                      11

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electron transport across the film is required to keep the overall  corrosion
process going.
     In addition to providing a physical picture of the overall corrosion
process and an accounting of the principal chemical reactions involved, the
Ives/Rawson study included an evaluation of the effects of several  solution
species common to natural waters that do not participate explicitly in the
reaction mechanism of copper corrosion.  The effects of chloride, sulfate,
nitrate, and bicarbonate ion on corrosion rate were evaluated experimentally.
While a complete explanation as to how each of these anions affects the
corrosion process is lacking, they all are reported by Ives and Rawson (4) to
influence the corrosion process by adsorbing at the oxide/solution  interface.
     Chloride ion was found to have the most significant effect on  copper
corrosion of all the anions evaluated.  It was found to penetrate the porous
oxide layer and absorb strongly at the underlying Cu?0 solution interface
increasing the rates of the copper dissolution, CiuO film growth, and Cu20
dissolution reactions.  The effect at 100 ppm chloride was to double the
corrosion rate over that measured in chloride free water.  The presence of
chloride was also found to initiate a change from general corrosion to
localized corrosion by becoming incorporated into the Cu-O film and altering
its transport properties.  Unlike chloride, the other anions tested (sulfate,
nitrate, and bicarbonate) all showed minimal influence on the corrosion rate.
Calcium bicarbonate was reported to induce a slight passivating effect,
reducing the corrosion rate.
     The Duplex Film Model gives a complex picture of a corroding copper
system, that in appearance might be difficult to quantify.  A physical
picture of the overall system that is easier to work with quantitatively is
accessible by making several reasonable assumptions:
     1.  The continuous film, underlying the broken up or porous outer film,
         is composed solely of Cu^O and is of constant thickness.
     2.  The outermost, broken up and porous, film provides essentially no
         corrosion protection since water flows into the pores and  cracks
         making direct contact with the underlying continuous film.
     3.  The pores and cracks in the outer film are large enough that diffu-
         sing species in the liquid do not have a longer diffusional path due
         to the presence of the outer portion of the film.

                                      12

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With these assumptions one can view the corrosion process in terms of the
                        ti
simplified model shown -in Figure 2.
     When each of the ch3mical reactions participating in the aqueous corro-
sion of copper is placed in its spatial context, as shown in Figure 3 below,
the rate processes required for corrosion to occur become apparent:
     1)  Kinetics of the interfacial reactions is one process involved.
     2)  Transport of CL and H+ through solution to react at the oxide/
                                          o i              yi
         solution interface and of OH", Cu   , and other Cu   complexes away
         from the interface are other participating rate process.
     3)  The transport of copper cations and electrons across the oxide film
         is also a necessity for the overall reaction to continue.

     Quantification of these rate processes  requires knowledge of some of the
properties of the oxide film separating the fnetal and the aqueous phase.
Cuprous oxide exists in nonstoichiometric ionic crystalline form as a p-type
semiconductor.  It is nonstoichiometric in that it contains a deficit of both
copper cations and electrons.  These deficits are manifested as point defects
in the oxida.  So cuprous oxide contains ionic defects (cation vacancies)  and
electronic defects (electron holes).  These defects are involved in the
interfacial reactions as well as in the transport of charge across the film.
     Interfacial reactions involvin; transfer of copper cations are more
precisely written as either producing or destroying cation vacancies.  When
copper dissolves, the oxidation reaction occurring at the metal/oxide inter-
face involves a singly charged copper cation leaving the metal lattice and
entering the oxide.  This reaction is normally written as:
          Cu 	> Cu*1 + e"                                               (1)
The creation of a copper cation shown by equation (1) above can also be writ-
ten in the following form as a defect reaction in which a cation vacancy
within the oxid2 is destroyed:
          Cu + Cu+[]	> e"                                              (7)
Here Cu+[] symbolizes a singly charged copper cation vacancy within the
oxide, which is written as a reactant since it is consumed in the reaction.
                                      13

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COPPER
   Cu
CUPROUS
OXIDE
 Cu,0
AQUEOUS SOLUTION
H20,  02,  H , etc.
Figure 2.  Simplified Copper/Oxide/Water System.
       COPPER
   CUPROUS
   OXIDE
                           Cu
                       e"+ Cu.,0-
  AQUEOUS SOLUTION
 H2°
     u.,0 + H*
                                     OH
                                  H2°
                             H,0
                                  H
Figure 3.  Chemical Reactions Involved in Aqueous Copper  Corrosion.
                              14

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The electron transfer in equation (7) above can be written in terms'of its
electronic defect:
          Cu + Cu+[] + h	> 0                                           (8)
     o
Here h is an electron hole (electron vacancy) in the oxide.  It is also writ-
ten as a reactant since it is consumed in the reaction.  The symbol 0 stands
for a completely occupied and charge balanced lattice site within the oxide.
The electron produced, as the copper cation leaves the metal lattice, enters
the oxide by consuming an electron hole in the oxide.  In this manner cation
vacancies and electron holes are consumed at the metal/oxide interface.
     The three remaining reactions occur at the oxide/solution interface.
Each ones involves creation of cation vacancies or electron holes, or both
within the oxide.  The general picture then is that point defects, cation
vacancies and electron holes, are created at the oxide/solution interface by
reactions between the oxide and solution, and are consumed at the metal/oxide
interface by the reaction occurring there.  A net migration of cation vacan-
cies and electron holes from the oxide/solution interface to the metal/ oxide
interface is then required for the overall corrosion process to continue.
The details of defect formation and consumption will be discussed in the
upcoming section on  interfacial reaction kinetics, while the mode of defect
transport across the film will be discussed in the section on oxide film
growth and transport.

INTERFACIAL REACTION KINETICS
     Three of the four principal reactions involved in the corrosion process
could limit its overall rate.  In this section rate expressions are developed
that show how the chemical composition of the solution affects the corrosion
rate when controlled by the kinetics of a particular reaction.  A summary of
the reactions and equilibrium expressions necessary for development of appro-
priate rate expressions is provided in Table 1.  Rate control by one parti-
cular reaction occurs when the velocity at which it proceeds is so much
slower than other rate processes that they are virtually at equilibrium.
Since detailed mechanisms for each of these reactions have not been devel-
oped, it is not possible to derive rate expressions in as rigorous a manner
as one would like.   Rather, a more simplistic approach is taken here which

                                      15

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                                  Table  1


            Sa-rrcary of Interfacial Reactions and  Equilibria
I.   Metal/Oxide Intertaca:
         Cu   i.. a Cu  + e* (nwtal dissolution)
                                                           K.
    •               .                                        I     *

         Cu * Cu   + h —*0  {defect fora)                           "




11.  Oxide/Solution Intorfaca:



          *'   '    -         I        *
         Cu   + — HO   -      TCu 0 + H  (film growth)               +






         MCu *  2*2° -•—-—-- Cu2° * Cu*'' * H*
         ^.-•^=±^.1^,..-   '»»£   ^  _ ,0401^



         1        •   *                2*   I                 3     ^"H>1
         — Cu 0 + h * H  „     Cu 11  +• Cu   * — HO
         22                              22



         '+-*.!                                           1/2 "
         -0  -t-H  * o  ^—'-*• ~ n Q         (0  Reduction)             |H2°2'   lhl
    C'K-
         T°, *"7H,° * Trrr?*0"          (0  Reduction)                 "
         42   22     ^                  2                          I li I k






         j02*^H205=±OH- + ;





Notation;




    N   " copper ntoa filling o  lattice site «lthln the oxide, Cu,0.
     Cu                                                   2



      h - an electron vacancy (holo) In tn@ oxide.




    CuC}" o cation vacancy In tho OK Ida




      P « partial pressure of oxygen In liquid phase




Assumptions:  (&* 1-1.0  ,IH,OI « 1.0,  »H ICu 0] - 1.0.
              Cu           2                &•
                                       16

-------
sometimes assumes that a reaction occurs in one step when in fact it may
occur 1n several.  With this in mind, rate expressions are derived for three
of the four principal reactions.

Rate Control by Metal Dissolution
     The metal dissolution reaction involves metal atoms leaving the metallic
soMd to fill cation and electron vacancies in the cuprous oxide.  It occurs
at the metal/oxide interface and can be written as follows:
          Cu(m) - > Of1"1 + e"                                            (1)
or in defect form as:
          Cu(m) + Cu+[] + h - > 0                                        (8)
The corrosion rate is the rate at which copper metal dissolves:
The metallic copper  activity  is  presumed to be  one  in this derivation and
cation vacancies  and electron hole  concentrations are presumed to be small
enough that their concentrations approximately  equal their activities.  The
corrosion  rate  then  depends on the  magnitude  of the rate constant, k~(E),
which is potential dependent  as  well  as the metal/oxide intarfacial concen-
tration of cation vacancies and  electron holes.   Imposing the condition of
virtual equilibrium  of  other  rate processes allows  development of a rate
expression which  connects  the corrosion rate  with the chemical composition of
the solution.   Virtual  equilibrum of  all reactions  occurring at the oxide/sol-
ution interface fixes the  concentration of cation vacancies [Cu []] at the
oxide surface.  Chemical equilibrium  at the ox ickY solution interface requires
that reactions  Ila,  lib, and  He of Table 1 be  at equilibrium when the
solution pH is  less  than 7.0,  and that reactions  Ila, lib, and lid oe at
equilibrium when  the solution pH is greater than  7.0.  Expressions for
interfacial equilibrium are derived as fellows:
                                       17

-------
a)   at pH _< 7.0:

     MCu + 1/2 H2° - > 1/2  Cu2°
                                            +  (f11m growth)
     1/2 02 + H+ - > 1/2  H202 +  h         (oxygen  reduction)
     1/2 Cu20 + H+ + h - >  Cu+[] +  Cu2+  + 1/2  H20  (film  dissolution)
     M   + 1/2 0  + H+ - >  2Cu+[] + 1/2  H0 + Cu
     V  =
          [Cu+[]]2 [HOJ1/2 [Cu2+]
                     l/2
                                     -If
                                        2  '
                                                  2+
     CCu+[]] =
                    KP
                       1/2
                                 1/2
                                                                     (10)
b)   at pH ,> 7.0:
     M* . + 1/2 H^O
      Cu
          D2 + 1/2 H2 0
          :u~0 + H+ + h
                               ->  1/2  Cu90 +  Cu+[] +  H+
                               ->  OH"  +

      Cu
                H°
                                          OH
     KII=V
                 C3]*  [OH"]  [Cu^T]
                    Dl/4              K2 *  ^3
     CCu+[]] =
                       1/4
               [Cu2i"][OH']
                           1/2
                                        1/4
                                            1/2
                                                     + 1/2
                                                                     (11)
                                  18

-------
The equilibrium expressions derived in (10) and (11) above establish the
necessary link between cation vacancy concentration at the oxide/solution
interface and certain chemical components of the solution.  They show ex-
plicitly, that the interfacial concentration of cation vacancies depends upon
the partial pressure of dissolved oxygen, the concentration of cupn'c ion in
solution, and the hydrogen ion concentration as well as a temperature
dependence imbedded in the equilibrium constants.
     At this point it is necessary to establish a relationship between the
cation vacancy concentration at the metal/oxide interface, which is directly
proportional to the rate of copper dissolution, and the cation vacancy con-
centration at the oxide/solution interface, which is in equilibrium with sev-
eral chemical species in solution.  For rate control by interfacial reaction
kinetics, transport of cation vacancies and electron holes across the oxide
film must occur at a much more rapid rate than the  reaction controlling the
overall rate.  This situation is likely to occur during the initial stages of
formation of the filrn, that is, when the metal surface is covered with oxide
but the film is of insufficient thickness to allow  a concentration gradient
of cation vacancies to build  up.  Under these conditions:
          [Cu+[]]m/0 = [Cu*[]]0/s                                        (12)
When the oxide film grows to  a greater thickness a  gradient of cstion vacan-
cies across the film is established even at virtual transport equilibrium due
to the presence of an electrostatic field within the oxide film.  Under these
conditions:
          [Cu+U^o = a [Cu+[]]0/s                                      (13)
where a is a constant, with a value less than 1.0,  that depends on the magni-
tude of the electric field in the oxide.  When the  absolute value of the
charge on copper cation vacancies is given as ze, Freehold (10) has shown
that:
          . - e-(zeLE/kT>                                                (14)
Thus, at a given temperature, T, film thickness, L, and electrostatic field
strength, E, the ratio of cation vacancy concentrations at the t#o interfaces
is fixed.  As variations in the solution composition occur, which cause
changes in cation vacancy concentration at the oxide/solution interface, the

                                      19

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cation vacancy concentration at the metal/oxide  interface must adjust to
maintain a.  As it changes the rate of  copper  dissolution changes proportion-
ately.  This sequence of events is expressed in  the following functional
form:
     a)   at pH < 7.0:
          R = ME)'
                        K
                             /2
                     [H202]1/2  [Cu2+]
                                       1/2
                                                               (15)
and b)    at pH _>  7.0:
          R =  k(E)
                        KnP
                            1/4
                     [Cu2+]  K.
                                 1/2
                             ll/2
                                                               (16)
Equations  (15)  and  (16)  are  derived  for the  initial filrr. growth situation,
where a =  1.0.   Analogous  expressions,  for conditions  in which a fully devel-
oped oxide filrr. is  present,  can  be derived by multiplying the right hand side
of equations  (15) and  (16) by  a.  These expressions can be simplified into a
form quite suitable for  comparison with measured  data.  Equation (15) can be
rewritten  as  a  function  of solution  pH  as follows:
                                                                         (17)
log1QR =
where:    a.  =  k(E)
               s  - 0.5 pH
                            K,P
                               1/2
                       L'H202]
                             1/2
                                        1/2
Note that  all  temperature  dependence  is  consolidated  into the a. tenr. and
        '*+
that [Cu   ]  and  [H?0?]  are assumed  constant  with  respect to  solution pH,
which  is at  best an  approximation.  Equation (16)  can be rewritten  in a
similar fashion-(for pH _>  7.0):
log,Q R =
                              -  0.5  pH
                                                               (18)
                                       20

-------
             = k(E)
     Again all temperature dependence resides in the a- term.  The slope of
log R with respect to pH should be independent of temperature at pH < 7.0 and
pH _> 7.0.  The corrosion rate under conditions of rate control  by copper
dissolution is therefore shown to depend upon cupric ion concentration in
solution, oxygen partial pressure, solution pH, and temperature.

Rate Control by Cu20 Formation
     The CupO formation reaction involves a copper atom within  the oxide,
MP , reacting with water to form more oxide and produce cation  vacancies in
the film.  It occurs at the oxide/solution interface and can be written as
fol1ows:
          M£U + 1/2 H20 	> 1/2 Cu20 + Cu+[] + H*                       (19)
When this reaction controls the rate of the overall corrosion process the
following rate expression pertains:
           jrt»X -i
     R	-— = kf [Mju][H20]1/2 - kr [Cu20]1/2[Cu+[]][H+]          (2C)

When the activities of M£U, H20, and Cu20 are presisned to be unity the rate
expression becomes:
          R - kf - kr[Cu+[]] [H+]                                        (21)
Note that this rate expression presumes tne reaction to occur as a one step
process, which is at best an approximation.  The cation vacancy concentration
at the oxide/solution interface is fixed by the virtual equilibrium of other
reactions occurring there.  Separate rate expressions are necessary to des-
cribe the corrosion rate at pH values below and above 7.0.  At  pH <^ 7.0 the
concentration of cation vacancies at the oxide/solution interface is derived
as follows:
                                      21

-------
          1/2 Cu20 + r + H+ - > Cu+[]  +  Cu2*  +  1/2  H2
          1/2 C2 + H* - > 1/2 H202
1/2 ':u
           1/2 02 + 2H1
                              Cu+[]
1/2H202 + 1/2H20  KIH = k3.k4
                          l/2
therefore:  [Cu+[]] =   (-
                            l/2
                                [H202]
                                      l/2;
                                                      (pH £ 7.0)
                                                                          (22)
Solving equations (21) and  (22)  simultaneously produces  the following rate

expression:
fkr
pl/2,
T T T
[Cu2+][H20
]1/2
2J
CH+]3
                                                                          (23)
This relationship can  be  rewritten  in a general  form suitable for coiiiparison
                            Oj.
with measured data  wtien [Cu  ]  and  [HCLj  are presieried not a function of pH:
          R = a -  b  10
                       -3pH
                                                                          (24)
Here both a and b  are  ter.perature  dependent.

     At pH >^ 7.0 the concentration of cation  vacancies  at  the oxide/solution

interface is derived as  follows:

     1/2 Cu20 <• h  + H* - >  Cu+[] + Cu2"*" H-  1/2 H20        k-j

     1/4 02 + 1/2  H20   - >   OH" + h                      k&
     1/2 Cu20
                      1/4
                                   Cu+[] + Cu2+ + OH"

-------
                     Pl/4KIV[H*]   F1/4K.,[H+]2
therefore: [Cu []] =	^		l^L	    (pH > 7.0)              (25)
                              '
Solving equations (21) and (25) simultaneously produces the following rate
expression appropriate at pH _> 7.0:

                          ,1/4
                                                                          (26)
          R - kf - kr
                      L1
When rewritten in a general fonr, suitable for comparison with daia the
following relationship  1s obtained:
          R - a - bj 10"3pH                                              (27)
where both a and b. are terperature dependent.  Here a has the saire value
below and above pH « 7.0, while b takes on different values in the two pH
ranges.  The general fonr. of the rate expression for rate control by Cu00
formation is thus established as a function of cupric ion concentration,
oxygen partial pressure, solution pH, and temperature.

Rate Control by 0? Reduction
     The rrolecular oxygen reduction reaction involves the reaction of aqueous
dissolved caygen at the oxide/solution  Interface.  0- adsorbs and accepts
electrons (produces electron holes) at  the oxide surface providing the reduc-
tion half-cell for the  overall redox process.  This reaction occurs by a
sequence of steps which are different at pH values below seven than for pM
values above seven.
     At pH < 7.0, 0, is reduced through intermediate fonr>at1on of H^0?.
                   C.                                               i- £-
There sre differing opinions as to whether the reaction steps at FLO^ °r
proceeds Beyond to H?0  fonr.ation.  Both reaction possibilities will be
presented, with reduction to H-O^ presun^d to be the favored pathway.  The
overall reaction can be written in two  steps as follows:
                                      23

-------
2H+	> 2h + H902          (i)

                 H2
                 2H+	> 2h + H«0        (ii)
          02 + 4H+	> 4h + H20

Vetter (11) has reported a composite of experimental evidence from many
investigators for 02 reduction en metal surfaces in acidic solutions and has
presented the following rate expression:
          R = k(E) P                                                     (28)
This expression apparently holds no matter whether the reduction goes just to
H202 or all the way to H?0.  On oxide covered surfaces the reduction rate is
reported by Yeager (8) to be slower than on metal surfaces with intermediate
formation of H^O^ also being the predominant pathway.
     When the solution pH is equal to or greater than 7.0 the mechanism is
slightly different.  The reaction is irreversible and has the following
stoichiometry:
          02 + 2H20  	> 4h + 40H"
Vetter (11) has proposed the following rate expression for 0? reduction on
metal surfaces which is in accord with the mechanism proposed by Yeager (8)
for oxide covered surfaces:
          R = kf(E) P [H+]                                               (29)
It is interesting to note that only above pH = 7.0 does the reaction rate
become pH dependent.
     Rate expressions have been presented for conditions of rate control by
02 reduction at pH values below and above 7.0.  Unlike rate control by other
reactions, there is no dependence on defect concentrations within the oxide;
in fact, only the potential drop across the Helmholtz layer at the oxide/
solution interface, pH, and P affect the corrosion rate under these condi-
tions.
     Mechanisms and rate expressions have been presented here for the princi-
pal reactions involved in the corrosion process.  By looking at the rate
expression one can identify the variables that affect the corrosion rate when

                                      24

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rate limited by a particular reaction.   In this way the effect of solution
composition on the overall rate becomes  apparent  provided the  Ives/Rawson
ir.echanism is qualitatively accurate in describing the corroding system.
     Table 2 contains a sumr.ary of appropriate rate expressions.

OXIDE FILM GROWTH AND TRANSPORT
     Transport of charge  across a continuous oxide film growing on a corrod-
ing copper surface is one of the fundamental rate processes composing the
corrosion process.  As such, it could limit the rate of the overall process.
In this section rate expressions are developed that show how the chemical
composition of the solution affects the  corrosion rate when controlled by
oxide film growth and transport.  Initially, physical and chemical properties
of the oxide that affect  the rate and mechanism of charge transport are
discussed.  This is followed by an explanation of how solid state transport
models are put together using  the coupled currents approach.  The electron
tunneling model is then presented to show explicitly the effect of solution
composition on the rate of charge transport, as well as the overall corrosion
rate when rate limited by oxide film growth and transport.
     The rate and mechanism of charge transport through a continuous oxide
film depends on several physical properties of the film.  First of all, film
structure is important, that is, whether the oxide has an amorphous or
crystalline form under the snvironmental conditions present.  Crystalline
solids tend to have spatially  uniform transport rates, while rates in an
amorphous solid are spatially  irregular  containing preferential diffusion
paths.  Near room temperature  cuprous oxide has a crystalline structure that
is a body centered cubic  lattice.  Consequently a film growth and charge
transport model is developed for oxide films that are both continuous and
crystalline in structure.
     The rate and mechanism of charge transport across the film are affected
by temperature, film thickness, nature of defect  species being transported,
and nature of the.electrostatic field developed witH-n the film.  For oxides
like cuprous oxide which  grow  by transport of charged vacancy defects a vari-
ety of growth mechanisms  are available and a growing film may switch from one
mechanism to another depending principally on film thickness, but also on
temperature.  For a given mechanism the  rate at which charged defects are

                                     25

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                               Table 2
Surnnary of  Rate Expressions for Interfacial  Reaction Rate  Control
             I.   Rate Control By >*ata.l Dissolution
                 R-.IHV2
             •hare:  a •
                             K(E)
                             k(E)
                                     K,P
                                        1/2
                     1/2
           £-1
                                                   1/2
             11.  Rata Control  by Oxida Formation
                 R » a - b(H*l
             whoro;
             and
a « k      6 all pM
       J/2
                              pH < 7.0
                                                          « pH 2. 7.0
                                 K,vP
                                    1/4 1
                                 tCu2*lK
                                                  6 pH < 7.0
                                                   8 pH 2.7-0
             III.  Rsts Control  by 0  Reduction
                  R - e
                  R - 8lH I
                  share:  8 * k  CE)P
       fi pH < 7.0
       9 pH > 7.0
                                  26

-------
transported across the film depends in some way on the magnitude of the
electrostatic field.  Some mechanisms are more rate sensitive to field
strength and temperature than others.
     Charge transport is presented here from the point of view of the coupled
currents approach, a conceptual framework developed by Fromhold (10) in his
treatise entitled "Theory of Metal Oxidation" to codify and provide a unified
basis for the variety of oxide film growth models that developed indepen-
dently during the years 1940 to 1975.  Most of these models were developed
for a specific set of growth conditions, so no general overview of metal
oxidation and film growth existed.  It took Fromhold's insight to character-
ize with such clarity and rigor the common threads running through the
different models.
     For oxides growing by transport of charged elecronic and ionic defects
different mechanisms are generally used to transport each type of defect.
Each type of defect then has its  own flux across the film called a particle
current.  Overall charge transport and oxide film growth rate depend on the
coupling of the electronic defect particle current with the ionic defect
paticle current.  The magnitude of the electrostatic field within the oxide
and steady state  film thickness adjust to balance the two defect particle
currents within the oxide.  This  is the coupled currents approach.  Transport
models based on this approach are composed of:
          a.  ionic defect transport rate expression
          b.  electronic defect transport rate expression
          c.  expression for electrostatic field in oxide

     When one defect particle current is sufficiently larger than the other,
at steady-state film thickness and electric field strength, the overall
transport or film growth rate may be completely controlled by the smaller
particle current, but the magnitude of electrostatic potential developed
depends on the faster defect particle.  This is the case for the electron
tunneling model presented next.   At early stages of film growth, ionic defect
                                                               o       o
transport limits  film growth, but for film thicknesses over 20 A to 30 A,
electronic defect transport begins to limit overall rate of film growth  (10).
                                       27

-------
Electron Tunneling Model
     The electron tunneling model was developed by Fromho'ld and Cook (12) by
bringing together the pioneering work of Mott (13) and Cabrera and Mott (14)
on low temperature growth kinetics of thin oxide films with later quantita-
tive developments by Simmons (15) on electron tunneling through potential
barriers. The result is a quantitative model which predicts the rate of
                                     4
growth and steady-state transport rate of charge through the very thin oxide
films growing on metal surfaces at temperatures near 2b°C.  The electronic
defect transport mechanisms for this model involves quantum mechanical tun-
neling of electrons from the metal through the potential barrier of the oxide
film to ultimately fill vacant energy levels in molecular oxygen adsorbed at
the oxide/solution interface.  It is a mechanism that is appropriate only at
low temperature and for very thin films.  As temperature and film thickness
are increased the likelihood of other electron transport mechanisms, such as
thermal emissions of electrons or electron holes over the potential barrier
in the oxide is increased.  Figure 4 shows how the film growth mechanism is
affected by film thickness, temperature, and metal-oxide work function.  The
Cu-Cu~0 work function has the value X0 = 1.024 ev at 300°K (12) so the
     c.                               0                o
limiting thickness for electron tunneling is about 39 A for a Cu-0 film.
Above this thickness, thermal emission of electrons or holes should predomin-
ate as the electronic defect transport mechanism.
     The electron tunneling particle current is presented by Fromhold to be:

                                           -2m1/2L
          Je =  (8u2f.L)"1[(2X0 + eE0L) exp [— -- (2XQ + eE0L)1/2l -
                                              71

                           -2m1'2..            1/2
          (2X   - eEL) exp[ — - - (2X  - eE)1'^]                       (30)
             L - eE0L) exp[ — -
The rate of electronic tunneling across the film is seen to depend upon tne
film thickness, L, electric field strength, E , metal-oxide work function,
X0, oxide-oxygen work function, X, , and effective electron mass, m, and h
which is Plank's constant (li) divided by 2*.  For the electron tunneling
mechanism to be complete, relationships for the ionic defect particle current
and the electrostatic field strength must also be presented.
                                      28

-------
      Transition
      Thickness
          (A)
                      50
                      40
                      30
20
                      10
                                   Thermionic
                                   Emission
                            Electron
                            Tunneling
                        200    400    600    800
                                 T (*K)

     Figure 4.   Temperature  and  Film Thickness Dependence of Electron
                Transport Mechanism.
Ionic defect transport through the Cu^O film is by diffusion due to a
concentration gradient of cation vacancies across the film and a large
presumably homogeneous electric field within the oxide.  The cation vacancy
diffusion particle  current as developed by Fromhold for steady-state condi-
tions is as follows:
                                   .
J1 = 4a*exp{-W/kT)sinh(ZieE0a/kT)[-!
                  - C^O)  exp(Zte£0LAT)
                                                 (31)
     Here a is  the  lattice parameter which equals approximately 2A for Cu«0.
Vis the jump frequency  (sec"1) for ionic defects attempting to exceed a zero
field energy barrier of  height, W in ev.  kT represents the thermal energy of
ionic defects in  ev,   Z-e is the charge per cation vacancy*  EQ is the
electrostatic field strength (V/cin) in the oxide.  0^(1} is the concentration
                                                                 "-t
of ionic defects  at the  oxide-solution interface (no.  of defects/on") while

-------
C.j(0) is the concentration of ionic defects in the oxide near the metal/oxide
interface (no. of defects/cm3).   L is .the thickness of the film in A.
     When the two defect particle currents are subjected to the coupled cur-
rents condition, s  relationship  for the electric field strength, E , can be
developed.  The coopled currents  condition is:
             i       a
                      = 0                                                (32)
     Where q^ is the  charge on each ionic defect, Z-e, and q  is the charge
on each electronic defect, e.  By  substituting the relationshios for each
particle current into equation (32) one may in principle solve for E .   For
                                                                    o
this model and others analytically solving for E  is not possible so the
model is evaluated under  special limiting conditions.  There are two limiting
conditions amenable to  solution  for the electron tunneling model.  The first
condition arises Khen the film is  just thick enough for rate control by
defect transport.  This ir called  the early growth stage, and for the
electron tunneling model  the growth rate is limited during this stage by
ionic defect diffusion  and the electric field strength is dictated by the
virtual equilibrium of  electronic  defects.  The early growth stage model  can
be represented as follows:
J1 = 4a\)exp(-w/kT)  sinhU^eE,, a/kT)
                           *  U           i   	/ ~r _ r- i /t.-r\              / *3 1 ^
               - XL)/Le                                                  (33)
Equation (31) can be simplified by noting that for L =  5A,  T  =  298°K,
                        f
                       •,-8
and E  = 10  v/cm the  value of the exponential term is much smaller than one:
so the term:
                           10

                           ) exp (Z.je E0L/kT)
                  1 - exp (Zje EQ L/kT)
Substituting this back into equation (31) above yields the following expres
sion for the ionic defect particle current:
                                      30

-------
          J1  = 4 aVexp(-w/kT) sinh(ZieEQ a/kT) C
                                                                         (34)
     Since the field strength, E , is not affected by defect  concentrations
the only place solution composition can affect the rate of early  stage  growth
is through the oxide/solution interfacial concentration of cation vacancies,
C^L).  For virtual equilibrium of interfacial reactions at the oxide/solution
interface two relationships derived earlier in evaluating interfacial reaction
kinetic rate control are appropriate.  At pH < 7.0, recognizing that
[Cu n]Qx^HS surff -e = ^j^). t^ie interfacial cation vacancy  concentration is
related to species concentrations in solution by the following relationship.
                         1/2
or:
          ML)
                   [H202]1/2[Cu2+]

                   "  v  nl/2
                   [H202]1/2[Cu2+]
                                   1/2
1/2
1Q-0.5 pH
                                                                       (10)
(35)
At pH < 7.0, a similar relationship exists.  It was derived earlier
to be:
                      ,1/4
                             1/2
                                                                       (11)
or:
                      ,1/4
                          w.
                             1/2
                                 10
                                   -0.5
                                     (36)
So the relationship hetween pH, P, [Cu+2], and J1 is explicitly shown  for
pH < 7 as well as for pH >^ 7 for early stage growth.  The pH dependence  of
the rate of film growth can be summarized as follows:
a)   At pH < 7.0:  J » d 10~°*5 pH                                     (37)
                                                 K
     where d » 4 aV exp(-w/kT)sinh(ZieriEa/kT) [
                                    1 °
and:       log J = log d - 0.5 pH
                                                               I/?
                                               [H202][Cu]
                                                                       (38)
                                      31

-------
     b)   at pH > 7.0:  J = d 10'°'5 pH

where:    d = 4a  exp(-w/kT)sinh(ZieEQa/kT)
                                                             (39)
                                      ,1/4
                                   [Cu2+] K
                                               1/2
and:
log J - log d - 0.5 pH
                                                              (40)
The temperature dependence is contained in the values of the constant b for
both equations.  Log J versus pH then plots as a straight line with a slope
of -0.5.
                                                             o
     When the oxide film gets thicker, approximately 20 to 30A, the electron
tunnel particle current becomes rate limiting with the field strength deter-
mined by the virtual ionic defect equilibrium.  When this situation arises
the transport rate is:
(8
(2XL - eEQL) exp[-
                 2m
                   eEQL) exp[-2m

                   1/2
                                1/2  "
                                                         EoeL)1/2] -
                                          - eEQL)1/2]]
with:
     Z1 e L
                          IC
(30)
                                                               (41)
Here the electric field strength, EQ, is dependent upon the cation vacancy
concentration at the oxide/solution  interface, but is the only term in the
transport rate expression with such  a defect concentration dependence.  E  is
therefore the only term that  responds to solution composition through C^(L).
The relationships, equations  (35) and (36), shown before which connect C,(L)
                            +?
with solution pH, P, and [Cu  ] still apply under later growth stage condi-
tions.
     Equation (30) can be simplified by evaluating the magnitude of the two
                                        o             c
exponential terms for T = 298°K, L = 30 A, and EQ - 10  v/cm.  The first term
inside the brackets of equation (30) is found to be much larger than the
second:
 (2X
       eEQL) exp[-2m1/2 V1 L(2XQ
                                              eEL)1/2]
(2XL - eEQL) exp[-2
                                                   1/2
                                      L(2XL - eEQL)]
                                                          500
                                      32

-------
The second term may then be omitted from equation (30) as being negligible
when subtracted from the first.  The simplified rate expression becomes:
     J = [8iA L2r1(2XQ + eEQL)
                                                  o + eV-)1/2l
                                                     (42)
As pointed out by Gibbs  (16), a further simplification o-f equation (42) is
possible for cuprous oxide films in aqueous electrolytes, provided the
potential drop across the film is small.  When the potential drop across the
film 1s on the order of  tens of millivolts, the electron tunneling rate
expression has been reduced by Simmons (17) to the following ohmic form:
          J = bV                                                         (43)
where:    V = EQL
kT       C,(L)
—  In [-!	]
Z,e      C,(0)
  1         1
                                                                         (44)
          b »  a  positive  constant  (temp,  independent)
Solving equations  (43)  and  (44)  simultaneously the following expression is
obtained:
                                                                         (45)
Since C.(L) is related  to  solution  composition by equilibrium expressions
derived  earlier:
     a)   At pH  < 7.0:
                          ,1/2
                    [H202]1/2
                                       10
                                         -0.5 pH
                                                                         (35)
 and   b)   At pH >_ 7.0:
                       ,1/4
                           w
                               1/2
                                   10
                                    -0.5 pH
                                                                         (36)
 Equation  (45) may  be  rewritten  as  follows for  pH < 7.0:
                                      33

-------
                      ,„
                                     [Cu2+]
                                            1/2
                                       10
                                         -0.5 pH
                                                                         (46)
Rearranging and separating out the pH dependence the following form
evolves:
          J =
          + C2 pH)
                                                                         (47)
C = b In
1 Z.e
2 ~TTF~

KjP1'2
1 /p oj.
ru n l1'^ rrn*- 1
LH2U2J LLU J
CjtO)
1/2
where:
and
At pH < 7.0 tne rate is shown to be a linear function of solution  pH,  with
the slope, kTC2, of the J versus pH plot a linear function of temperature.
The intercept, kTC,, is a nonlinear function of temperature since  both K, and
P are temperature dependent components of C,.  Its temperature dependence
then should be slightly greater than linear.
     For pH 2. 7.0, equation (45) may be rearranged in a similar fashion with
the following result:
                         pH)                                             (48)
                             ,1/4   1 1/2
J =
                      C2
where:
and
Note that both parameters C, and C? have the same temperature dependencies as
those derived earlier at pH <_ 7.0, with C,, having identically the same magni-
tude at pH < 7.0, that it does at pH < 7.0.
     Rate expressions have been derived in this section that show explicitly
the manner in which P, cupric ion concentration, hydrogen peroxide concen-
tration, solution pH, and temperature affect the rate of copper corrosion
                                      34

-------
when under rate control by oxide film growth *nd transport.  A su.mary of
these relationships is provided in Table 3.

SOLUTION MASS TRANSPORT
     Mass transport in aqueous solution refers to the individual movement of
Ions and molecules through solution due to the presence of sane driving
force. This driving force may be a concentration gradient in the case of
diffusion, a potential gradient in the case of migration, or a component of
solution velocity in the case of convection.  The rate of mass transport is
                            P
measured as a flux (moles/cm  sec) and is normally the phenomenon of interest
1n chemically reacting systems.  This could be the flux of e reactant from
bulk solution moving toward the interface or the flux of a reaction product
moving away from the interface into bulk solution.  In aqueous corrosion,
molecular oxygen and hydrogen 1on are solution species that act as reactants
1n the reduction half-cell, while hydroxyl ion is a product of the reduction
half-cell.  If the reaction rate is fast enough, the transport of molecular
oxygen, hydrcxyl ion, or hydrogen ion through solution may be the rate
controlling step in the reduction half-cell or even the entire corrosion
process.  The possibility of rate control makes solution transport phenomena
an Important subject of consideration.  In this section the basic equations
of solution transport will be presented along with some development of their
chemical and hydrod;/namic aspects.  Existing models for majs transport in
pipe flow will be presented which can be used as a basis for estimating
limiting fluxes of hydrogen ion, hydroxyl ion and molecular oxygen at varied
temperature, pipe size, pH, and flow velocity.

Principal Transport liquations
     Two principal equations (18) that characterize the mass transport of a
species In solution to and from the solid/solution interface ore the overall
mass flux equation and the material balance equation.  Each of these can be
uniquely derived for a particular species in solution.  The overall mass flux
of species it may be represented as follows:
     JNj « -DiVCi - ZjUjFCjVi?  + V[Ct                                      (49)
Equation (49) is written here in vector fora appropriate for ? variety of

                                      35

-------
                                     Table 3


Sunmary of  Rate Expressions for  Oxide Film Growth and  Transport  Control
   I.   Early Stage Mia Grcwth  (ZA < L < 15 A)
       R - «
       •her»:
                                        e£a/hT)
                                                  K|P
                                                      1/7
      1/2
                            (-«/kT>»lnh(2
                                                K   P
                                                 II
                                                  2*
                                               ICu  .l_JC
                                                      «J
1/2
               <  r.o
          e J»H  > 7.0
   11.  Later Stogo Flls Sroafh  (15 A < L < 3?
       R • kT(C  * C
       whera:
                                                          a PM  >  7.0
                                                          (ell
   and  b » a (voa!Tlw* constant
                                              .  So* (t?)
                                        36

-------
flow geometries.  The mass flux, _N^ » of species 1 1s the rate of movement of
species 1 across an area perpendicular to Us path (moles/sec cm2}.   This
rate depends on the magnitude of the concentration gradient, 7C^ , in the
direction of movement and the diffusion coefficient, D-.  They compose the
diffusional component of flux.  An electrostatic potential  gradient, vJ< , in
the direction of movement may also contribute to the mass flux provided
species i has a net charge.  This effect is called t..e raigrational  component
of flux.  The component of fluid velocity, V, directed normal to the mass
flux can exert an enormous Influence on the rate of mass transport.   This is
the convective component of mass flux.  The combined effects of diffusion,
migration, and convection then determine the nagnitude of mass flux  1n any
particular direction.
     The second principal equation characterizing mass transport of  species
1n solutions is the material balance (18).  It can be formulated for each
solution species as follows:
         dCj
                          R,                                             (50)
As a statement of the conservation of mass it describes the change in concen-
tration of species 1 with respect to time at a fixed point in space resulting
from the move?-
-------
          N,  = -
(51)
This form of the mass flux equation is appropriate for situations  where
potential gradients do not exist within the solution and  migrational  effects
are negligible.  It may be used where migrational  effects are present by
replacing the ionic diffusion coefficient for species i,  D-,  with  an  effec-
tive diffusion coefficient, Dgf , given by Pickett (19)  to be:
                          1
          Def ' Di
                    I
(52)
Here (n/S^) is the number of electrons consumed per mole of  species  i  reacted
or produced, Z^ is the charge on species i, and t-  is the transport  number  of
1:
           i   m
                  DJCJZJ
                                                                         (53)
for a solution containing m ionic species.  Equation (51)  then  becomes:
When species i reacts only at the suiid/soluticn interface and  not  in the
bulk solution, the bulk reaction term, R^, in the material balance  equation
is zero.  So the material balance can be written as:
              = -V- NI                                                 <55)
Solving equations (51) and (55) simultaneously the following  relationship
results:
                                                                         (56)
This relationship describes the concentration of species i  as a function  of
time and location as influenced by molecular or ionic diffusion and bulk
fluid motion, and is called the convective diffusion equation.   Analytical
                                     38.

-------
solutions to this equation for various hydrodynami c flow regimes comprise the
theoretical approach to solution transport problems (21).
     Most analytical solutions are to the steady- state problem where:
Equation (56) then becomes:
          V .VCj = D^2C.                                              (57)
     At low concentrations, where D- is not a function of C- , equation (57)
is analogous to the Fourier-Poisson equation for steady-state heat conduc-
tion, a problem that has been worked on for nearly one-hundred and fifty
years.  Analytical solutions exist for a variety of flow regimes (see Crank
(20)) and many solutions to the steady-state convective diffusion equation
were originally derived for heat conduction.
     The principal convective diffusion problem important in corroding drink-
ing water systems involves the transport of species in solution (hydroxyl
ion, molecular oxygen, and hydrogen ion) to and from the inner wall  of a
circular tube under conditions of laminar and turbulent flow.  Also, the
transport of solution species to the surface of a rotating disc electrode is
an important convective diffusion problem., since a rotating disc electrode
was used in the laboratory phase of this research.
     The point in solving this problem is ultimately to be able to:
          a.  Estimate an upper bound on corrosion rates due to solution mass
              transfer limitations.
          b.  Evaluate the effects of principal variables such as flow velo-
              city, pipe size, and solution pH on the limiting flux.

Pipe Flow
     The reynolds number, Re, is the appropriate dimension! ess parameter to
characterize pipe flow (22,23).  Its value depends on several system proper-
ties:
               d 
                                                                          (58)
                                      39

-------
where d is the inside pipe diameter (cm),   is  the mean solution velocity
down the axial length of the pipe (cm/sec), and ^ is the kinematic viscosity
                   o
of the solution (cm /sec).  Pipe flow at Re _< 2100 is generally laminar, for
2100 <. RE £ 4000 a transition region occurs, and at Re > 4000 flow is turbu-
lent.  Due to the physical differences in the flow patterns and the differ-
    t
ence'£ in velocity profile, separate solutions to the convective diffusion
equation exist for turbulent and laminar flow (24). Solutions under both
conditions will be discussed for pipe flow.
     Solutions of the steady state convective diffusion equation for pipe
Flow, involves first a transformation of the vector form of the equation:
          V .VCj = D^2 C1                                            (59)
into cylindrical coordinates, a geometry more appropriate for pipe flow.
Figure 5 shows the cylindrical coordinates r, y and (j) to he the radial,
longitudinal, and angular directions respectively.
     Written  in these coordinates there is angular symmetry, so the CA>depend-
ence drops out.  Making other appropriate assumptions, the form of the steady-
state convective diffusion equation becomes:
                 = D.
 ^(ry
L
(60)
 Determination of v  as a function of radial distance, r.  reduces the problem
 to only three variables C^, r, and y.  Then with appropriate boundary values
 for  Cj, this problem can be solved for the radial  component of flux, N-, at
 the  surface of the pipe.

 Laminar Flow
     Several noteworthy solutions to the steady state convective diffusion
 equation have been developed for laminar pipe flow.  Solutions by Graetz
 (25),  Leveque (26), and Levich (21) are presented here.   All presume fully
 developed Poiseuille flow, which means the longitudinal  component of velo-
 city,  v , is distributed parabolicly over the diameter as shown in the  figure
 below.
                                      40

-------

f
f-
\
\
\
I
1 /
	 ^
,* I
^ ^ '

y

^
\ (^ / r
\y* /
Figure 5.   Cylindrical Coordinate System.
Figure 6.  Parabolic Velocity Distribution Characteristic  of  Laminar Pipe
           Flow.
                                 41

-------
     This velocity distribution is described as:
     vy = 2(l - r2/R2)                                               (61)
All other components of velocity are presumed zero and the pipe surface is
presumed smooth.  Let's look now at specific solutions.

Graetz Solution
     This solution was originally developed by Graetz (25) for heat  conduc-
tion as a solution to the Fourier-Poisson problem.  It was later applied to
analogo'.j mass transfer problems.  Graetz used the method of separation of
variables to derive the following series solution:

          Di(CR ~ c«)   a  i  ?           y Di
     Ni =     2R        E  J \ \ e*&	H)                        (62)
      1       M       k=l i  k  k     2  R2

The eigenvalues, \k, and coefficients, Mk, have numerical values worked out
in the literature for k=l, .,., 10.  All other parameters are physical  and
geometric properties of the system.  With this solution one can predict the
mass flux of species i to or from the inside wall of a pipe of radius,  R,
when i is traveling in a fluid moving down the pipe with mean velocity, .
Note that the radial flux, N., changes with distance down the pipe from the
inlet (at y=0) and the solution is applicable for all values of y.

Leveque Solution
     The Leveque (26) solution treats the region where y values are  small,
close to the pipe inlet, and where r values are large, very near the wall of
the pipe.  The velocity distribution in this region was approximated by
Leveque to be:
          Vy = 4(l - r/R)                                            (51)
Like Graetz solution, Leveque1s work was initially presented as a steady-
state solution of the Fourier-Poisson equation of heat conduction then  later
extended to the  analogous mass transfer situation.  The solution is  as
fol1ows:
                                      42

-------
          Di(CB - Co)          y°i                              i
     Ni  = ~    2R    El.3566(	V)     - 1-2 - 0.296919(—-±
                             2r                        2IT

             yD,    2/3
        + 0(	!—=)   ]                                                  (64)
            2IT

It is considered appropriate only for short distances down the tube:

              0.02R2
          y < ——
Note that this solution depends on the same physical and geometric  parameters
as the Graetz solution.

Levich Solution
     This solution (21) parallels that of Leveque in that it  considers  only
the region very close to the pipe wall where the parabolic velocity profile
can be approximated as a linear function of radial  distance,  r.   Unlike the
Leveque case this solution is not derived solely for the inlet  region,  small
values of ys so its applicability is similar to that of the Graetz  solution.
Ths solution is as follows:
                                     
          N1 = 0.6884 DjtCg - CQ)
(66)
Once again the same physical and geometric parameters determine  the magnitude
of the mass flux.
     Each of these solutions has been corroborated experimentally  and  exten-
sive literature exists on the subject.  While these solutions  are  useful  in
preoicting transport limited mass fluxes under conditions  of laminar flow,
oftentimes fluid flow in pipes is not laminar.  These models alone are not
adequate to predict limiting fluxes in water supply and household  plumbing
systems over the entire range of flow velocities normally  encountered.   Mass
transport in turbulent pipe flow must also be considered.
                                      43

-------
Turbulent Flow
     Turbulent flow is characterized by rapid and random velocity fluctuations
about some time-averaged value at a fixed  point in space.  In addition to the
longitudinal component of velocity, eddies continually form and mix the water,
so transport takes place by both molecular motion (diffusion) and by turbulent
mixing.  The notion of a diffusion layer across which molecular or ionic
species must diffuse is maintained in turbulent flow although its thickness is
greatly reduced from that of laminar flow due to the turbulent mixing of
forming and dissipating eddies.  At present there is no single conceptual
picture of turbulent flow that is universally accepted, although many models
are presently being evaluated.  Because of the ill-defined fluid dynamics,
first principles approaches to turbulent transport have not been completely
successful in explaining experimental results.  Several empirical models that
correlate measured mass flux with flow properties have been developed and will
be presented along with solutions to the turbulent convective diffusion
equation.
     The convective-diffusion equation for turbulent pipe flow can be devel-
oped from  its original vector form:

          <>ci       ?
          —!•= D,9  Ci - V .yc,                                       (56)
          <>t

by replacing the concentration terms, C., with instantaneous turbulent
concentration:
           C1 = C1 + C!                                                   (67)
                                                            i
where C. is the time averaged concentration at a point and C. is the instant-
aneous  fluctuation in concentration from its time averaged value, C^.  The
velocity vector, ^, must also be replaced with an instantaneous velocity
vector:
           V = tf + V*                                                     (68)
                                                                   I
 where ^  is the time  averaged  fluid  velocity  vector  at a point and V^  is the
 instantaneous fluctuation  velocity  vector  from  the  time averaged value, ^_.
 When these time  averaged values  are inserted into eouation (56) above, the
 turbulent convective-diffusion equation  can  be  written as follows:
                                       44

-------
                      2                                                  (69)
where DtQt is the total diffusion coefficient incorporating ionic (molecular)
and eddy diffusion.

          °tot = Di + De                                                 (7°)
Here De is the eddy diffusion coefficient, which may be considerably larger
than the ionic (molecular) diffusion coefficient of species i.
     Equation (69) above can now be converted into cylindrical coordinators:
                                                                         (71)
and solved in a manner similar to that for laminar flow, provided the time
averaged longitudinal velocity component, v  , is knosn as a function of
radial distance, r.  Several empirical correlations exist relating v  and r
for pipe flow.  Commonly used correlations are v  = const,, v  is a linear
function of r or v  is a logarithmic function of r.  The value of the eddy
diffusivity, D , is also a function of r close to the wall.  Empirical
correlations relating D  and r exist, so at  least in principle the convective
diffusion equation is solvable for turbulent pipe flow.  Solutions developed
by Linton and Sherwood (27) and by Van Shaw  et al. (28) are representative of
the deterministic approach, which is still evolving, and will be presented.
Stochastic methods (29) are also being developed hut will not be discussed
here.  Another theoretical approach developed by Levich and extended by
Davies (30), that does not make use of the convective diffusion equation will
also be presented.

Solutions of Linton and Sherwood and Van Shaw et al.
     Van Shaw et al. solved the turbulent convective diffusion problem in a
manner identical.to an earlier solution by Linton and Sherwood (27).  By use
of cartesian coordinates (neglecting curvature) and assuming a linear
velocity profile:
                                      45

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                                                                         (72)

Here x is the distance variable normal to the, presumed flat, pipe surface
and takes the place of cylindrical coordinate, r.  y is still the direction
down the longitudinal axis of the tube.  Disregarding the dependence of 0  on
x the following solution was developed:
          ^ = 0.276 (CB - C0)Re'°'42 Sc'2/3 (L/d)'173               (73)
The time averaged mass flux in the x  direction, R. is given as a function of
the radial ir.ean of the instantaneous  time averaged velocities, , the
Reynolds number, Re, the Schmidt number, Sc, and the distance down the pipe
from the inlet, L.  The Schmidt number is defined here as:
          Sc = N;/D1                                                      (74)
where V* is the kinematic viscosity of the bulk solution (cnr/sec) and D- is
the molecular (ionic) diffusion coefficient.  This solution differs only
slightly from the earliar solution of Linton and Sherwood:
          Hi = 0.232(CB - C0)Re-°'4 Sc'2/3 (L/d)'1''3                 (75)
Data presented by Van Shaw et al . and Linton and Sherwood both show an
increasing tendency for the data to follow their theoretical  predictions as
pipe diameters are reduced to one inch or less and at Reynolds numbers
between 104 and 105.
Levich Solution
     The Levich model for mass transfer in turbulent pipe flow was not
derived as a solution to the turbulent convective diffusion equation.
Rather, it presumes the conceptual model of the liquid/solid interface as
shown in Figure 7  below.  The turbulent boundary layer, of thickness yb, is
divided up into three sections with differing resistances to mass transfer.
Mass transfer across each of the  three sections occurs by a different
mechanism and is evaluated separately.  At steady state the mass flux across
each of the three  zones is equal.  The steady- state flux is then derived by
                                      46

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                 Solution
                 Concentration  C
     Diffusion
     Sublayer
                                                     b Turbulent
                                                       Boundary
                                                       Layer
                              Main Turbulent
                              Stream
     Figure 7.  Levich Model for Turbulent Pipe Flow.
equating the fluxes and supplying appropriate boundary conditions.   In the
outermost zone, o  j< y £ y. , transport takes place by turbulent mixing, a
convective action.  In the middle zone, <5_ £ y £<£., the eddy diffusion
coefficient, De is presumed much larger than 0.= so that transport occurs by
eddy diffusion at a flux equal to  D  times the concentration gradient across
the zone.  In the inner zone, 0 _< y _<_  transport is based solely on
molecular diffusion at a flux equal to D. times the concentration gradient
across the zone.  Based on this analysis by Levich which was extended by
Davies (30) the following relationship for the mass flux developed.
Re
                         R
                                                                         (76)
This solution appears to be more closely in line with published data.
Empirical correlations based solely on experimental data will be presented
next.
                                       47

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Empirical  Correlations
     Two empirical correlations are commonly used to characterize mass trans-
port in turbulent pipe flow.  The Chi 1 ton-Col burn (31) correlation arose in
1934 out of an effort to correlate heat transfer data in turbulent pipe flow
with available mass transfer data.  It remains a useful correlation and is
given as follows:
                    .0115 D.(CR - C )   n o   ,n
                          -i-5	2_ ReO-8 Scl/3                        (77)

Another commonly cited correlation is that of Harriott and Hamilton (32):

                    .0048 D.(CB - C )   Q 913   Q.346                    ,7fls
          Ni(avg) =	IT	Re      Sc                         (78)

     Both relationships express the mass flux in terms of a value that is
averaged over distance down the pipe in a region of fully developed turbulent
flow.  Note that the  functional form of these correlations is similar to the
solutions of the convective diffusion equation.  While similar in form, the
two approaches, theoretical and empirical, represent different points of
view. The theoretical approach has its roots in some conceptual model of the
phenomenon which may  be a highly idealized (or naive) representation of what
is actually going on.  Empirical correlations, on the other hand, make no
pretenses at phenomenological explanations, they simply reflect the actual
tendencies that exist in measured data.  Clearly both have merit as well as
limitations.
     Mass transport through a stagnant liquid can be viewed as a special case
of the convective-diffusion problem where all components of solution velocity
are zero.  In this case the velocity term of equation (56) vanishes and the
following relationship results:

              = D,
          JT ~ ui v  "1
For the one-dimensional  case  in  cartesian  coordinates, the relation is a
statement of Pick's  Second  Law:
                                      43

-------
         c)CH
         5T = Di
with the following boundary conditions:

     at:  t = 0:  Cc = CR  — cone, at electrode equals  that  of  the
                   S    Bbulk

          t > 0:  C(- = 0   -- completely diffusion controlled

          and     as x —> «», C(x,t) 	> Cg


the standard solution, C(x,t), to this differential equation  is  given
(33) as:

                                      .1
          C(x.t) • CB erf
                            ^1727172
                                                                         (81)
                                       i
where erf (z) is short for the error function of ZB  a  standard  function with

values given in Table 4 below.


                                    Table 4
           Mass Transfer to Stationary Electrodes in Quiet  Solutions
                               from Adams p. 48

                           I                  erfj

                          0                  0,0000
                          0.2                0.2227
                          C.4                0.4284
                          0.8                0.7421
                          1.0                0.8427
                          1.2                0.9103
                          1.6                0.9764
                          2.0                0.9953
                          2.5                O.S996
                          3.0                0.999
                                             1.000


     Of interest, in corroding systems is not so mudt  the concentration

profile but the rate of mass transport through solution to  the  sol id/solution

Interface where the reaction occurs.
                                                  ?
     This rate is given as a flux, N9 in (moles/cur  sec) to the surrace as

follows:

-------
                                   l/2 CR
                                                                        (82)
So, the surface flux is a function of both time and bulk concentration for a
species being transported from the bulk to the surface to participate as a
reactant in a reaction at the solid/solution interface.  Adams (33)  reports
that conditions required for semi-infinite linear diffusion are difficult to
maintain for periods longer than about 30 to 45 seconds.  Natural  convection
due to thermal gradients and environmental vibrations tend to mix  the
solution and limit the time of stagnation.
     The flux given above is an instantaneous value which changes  with time.
A more appropriate value for a corroding system with stagnant water  would be
a time-averaged value of the mass flux.  Such a value can be determined by
Integrating the Instantaneous flux, N^ , over a stagnation time penod, t, and
then dividing by t (34):
                                      dt
which turns out to be the following:

                    D
                             CB

This relationship is applicable only when the solid surface is acting like a
shielded electrode (35, 36), that is, when the solid surface completely
surrounds the liquid in the directions normal to that of ma$s transport.   So
the actual surface of a corroding pipe does act as a shielded electrode,  but
a rotating disc electrode inserted into solution for corrosion rate measure-
ment does not.
     The correction factor for conditions where the electrode is not shielded
has been derived by Soos and Lingane (35) and l.ingane (36) to be:
          [1 + a(Dt/r2)1/2]
     where:  a « 2.12  (a constant)
             r = electrode radius (an) for disc electrode
                                      50

-------
The average flux to an unshielded electrode over time period t Is  then:
                                   v 1/2
          Navg ' T/rTT/2 tl - a(       J                               (85)
                 n
For solution species that are products of the corrosion reaction which must
diffuse away from the electrode surface to the bulk the average flux over
time period t is given (34) as:
          Nayg - 2(CS - CB)(DM)1/2                                     (86)
where C<- is the surface concentration of the diffusing species and Cg is  its
concentration in bulk solution.  Applying the correction factor for an
unshielded electrode, the average flux becomes:

          Navg * 2

-------
When all 58 data points were regressed in this form the following values for
K, a, e, and y were found:
          r = 0.948
          K = 7.962 x 103
          a = 0.333
          3 = -1.075
          ^ = .0328

     Using these regressed values the following quantitative form for
pHs results:
          PHS = (7.962X103) 0°'333  r1'075^'0328
     where:  0 = 1.0 - 0.32 pHp 4 0.039 pH 2 - 0.0015 pH 3
                              L'           IJ             D
             T = absolute temperature (°K)

In this form variations in the data with respect to all three principal
system variables are captured.
     The goodness of fit of this function is shown in Figures 57, 58  and 59
for comparison with data at 25, 15 and 5°C respectively.
     This regression equation, which incorporates solution  pH, T, and  <£"„,
to predict the variations in pHo, which must be estimated based on some  of
the same parameters, is an unsatisfactory modeling result.   The importance of
the pH at the interface is significant and is expected to have a controlling
effect on the rate of th« cathodic reaction, on Cu+ oxidation and on  precipi-
tation of Cu(QH)?, as well as determining the soluble copper hydroxide
species.  The regression equation does catalog the data in  a form that
predicts the estimated parameter, pHs, within reasonable limits.  The task of
understanding and mechanistically modelng the interfacial  reactions remains
for future studies.

CONCLUSIONS
     The finding that uniform copper corrosion in synthetic Tolt River water
proceeds under rate control  by solution mass transport of a reaction  product,
likely to be OH", is significant in providing direction for further research

                                    163

-------
 9,0  -
PH
   3


 8.0
 7.0
              6.0
7.0
                                    PH
                                       B
                STAGNANT  DIFFUSION
                                                    OXIDE HLM
8.0
9.0
       Figure 57.  Comparison of surface pH  values calculated  from data with those
                  predicted by empirical  expression for surface  pH at 25 C.

-------
9.0  .
8.0
7.0
             6.0
7.0
                                           STAGNANT  DIFFUSIOM
                                                  OX6DE  FILI
—r	——i	i
 8.0               9.0
     Figure 53.  Comparison of surface pK values calculated from data  with those
                predicted by empirical expression  for surface pH at 15  C.

-------
01
          9.0  \
 8


8.0
          7.0
                                                   STAGI^ANTXDJFFUSIOI
                                                            OXIDE  F9LM
                      6.0
                              7.0
8.0
9.0
                                               B
                Figure 59.  Comparison of surface  pH values calculated from data with those
                           predicted by empirical expression  for surface pH at 5 C.

-------
in copper corrosion in drinking water.  The study of precipitation and
complexation of dissolved copper species may prove to be the key to further
understanding of the complexity of processes making up aqueous corrosion of
copper.  This finding has implications for other metals as well.  Since
OH" is a product of the CL reduction  reaction, a cathodic half-cell for
almost all metal corrosion in aqueous solution of near neutral pH, its mass
transport, complexation, and precipitation by metal cations present m^y be
controlling the rate of other corroding systems.
                                       167

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                                  SECTION 7
      PROPOSED STEADY-STATE PIPE FLOW MODEL FOR UNIFORM COPPER CORROSION

INTRODUCTION
     The use of copper tubing for cold water transport in households  and
commercial buildings is widespread.  Problems arising from its accelerated
corrosion have been outlined earlier.  The principal value of corrosion
research performed in the laboratory lies in its application to real  life
corroding systems, such as copper tubing used for cold water plumbing.   In
this chapter a simulation model is presented that allows one to predict the
rate at which copper tubing will corrode under a given set of environmental
conditions.  It is developed based on the presumption that mass transport of
OH" is the rate controlling process and combined results of laboratory
studies presented in Section 6 with quantitative models for mass transport in
laminar and turbulent pipe flow presented in Section 4.  The result is an
ability to predict the rate of uniform copper corrosion in cold water
plumbing systems under varied conditions of flow, te?aperature and pH  of the
water.  Such a model can provide valuable insight, into identification of
principal variables affecting the overall processv the extent to which each
variable exerts an influence, and the range of magnitude in which the maximum
effect is manifested.  Possible strategies for corrosion controls, or  at least
corrosion rate reduction are also suggested.

RATE EXPRESSION DEVELOPMENT
     To develop a mathematical model that predicts the changes in corrosion
rate of copper due to variations in flcw5 temperature, and chemical composi-
tion of the water, the coupled effects of several rate processes need to be
considered.  As discussed earlier it is presumed that  the cuprous oxide film
covering the copper grows to sane steady-state thickness wSiere the rate of

                                      168

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film growth and the rate of film dissolution are equal.  The following stoi-
chiometric relationships were given for film growth and dissolution:

          CU+1 + 1/2 H20 	> 1/2 Cu20 + H+   (film growth)

          1/2 Cu20 + H+	> Cu2+ + 1/2 H20 + e" (film dissolution)

Both of these reactions occur at the oxide/solution interface and involve
either the production or consumption of protons.  When the rate of production
of Cu20 by the film growth reaction equals the rate of dissolution, or Cu?0
consumption, by the film dissolution reaction the net rate of proton produc-
tion by these two reactions is zero.  That is, the rate of H* produced in
film growth is exactly offset by the rate of H+ consumed in film dissolution.
     The other reaction occurring at the oxide/solution interface is the
molecular oxygen reduction reaction which has differing stoichiometry in
acidic and alkaline solutions:

          02 + 2H* + 2e~  	>  H202          at pH < 7.0

     and  02 + 2H20 + 4e~ 	>  40H~          at pH _> 7.0

Obviously there is net consumption of H  (or production of OH~) involved in
this reaction in both acidic and alkaline solutions.  Therefore, it can be
noted, that at the oxide/solution interface where film growth, film dissolu-
tion, and CL reduction all take place simultaneously an overall consumption
of protons occurs regardless of the solution pH.  The effect then of the
corrosion reactions is a tendency to increase the pH of the solution adjacent
to the oxide surface.  How large the pH change is depends on the overall rate
of 0? reduction, the buffer capacity of the solution and oxide surface, and
the rate of mass transport of OH" away from the surface into bulk solution.
     For a corroding copper system at steady-stats film thickness, rate con-
trol was shown to be due principally to the persistent effect of mass trans-
port in solution of a reaction product presumably OH".  It was also invlu-
enced by the underlying rate process through its effect on pH^.  This overall
                                       169

-------
ettect was captured by the empirical relationship derived for pH  as a
function of T, pHg, and  <5"n in Section 6:

     pHs = (7.9616 x 103)0°'33J (273.0 + T)"1'075^ D'°328

where:    0 = 1.0 - 0.32pHR + 0.039 pHg - 0.0015 pHg

     This expression for pH  was found to best fit the 53 data points
regressed and serves as an expression that catalogs the temperature, pH,  and
P dependence of the chemical process occurring at the interface.  When used
in conjunction wich laminar and turbulent mass transport pipe flow models,
uniform copper corrosion in those systems can be characterized.  The rate
expression used in the model here is that presented earlier in Table 4-5:

                  ?     nF Dnn
          I (pa/cm2) =  - £*-    [C, -  CR]
                       10~b
                I  453[___JL	]                             Laminar Diffusion
                      y DOH r                               (^ 1 2800)

                133 3r Re"0'88 Sc"°'333                   turbulent diffusion
                •   '                                           (Re > 2800)
                                       170

-------
          pHs - (7.9616 x 103) 0°'333 (273.0 + I)'1'075 V°328

          0   = 1.0 - 0.32 pHB + 0.039 pH^ - 0.0015 pH3

These relationships constitute the proposed steady-state pipe flow model  for
uniform copper corrosion.  As mentioned earlier they are a combination of
results of this research with results presented in the literature for solu-
tion mass transport in pipe flow.  These equations are easily programmed  on  a
digital computer.  Corrosion rate estimates, computed in this fashion, are
presented for flow in a circular pipe of one-half inch diameter.  Numerical
values for C, Kw, and  D are provided in Table 27 at 5, 15, ar.d 25°C.

                  Table 27.  Pipeflow Model Parameter Values
              T = 25°C             T = 15°C              T = 5°C
C
Kw
Sc
^D (Lam.)
^D (Turb.)
5.076 x 103
1.01 x 10"14
171.1
2.146 Re"0-333
84.646 Re"0'88
3.841 x 103
0.45 x 10"14
276.4
Sc-°<333
r)C-0.333
2.798 x
0.18 x
519.


103
io-14
0


The diffusion layer thickness, c>"D, depends on the Reynolds number,  Re,  and
the Schmidt Number, S  , the pipe radius, r, and for laminar flow the distance
down the axial length  of the pipe from its inlet, y.  Results presented
below are calculated using a pipe radius of 1/2 inch and an axial  distance  of
4.0 cm from the pipe inlet.  The Reynolds Number for pipe flow is defined as:
               d
where d is the inside pipe diameter (cm),  the mean solution velocity ir,
the direction parallel to the corroding surface ( = A/Q cm2/sec) , andv is
                                              o    J
the kinematic viscosity of the solution in (cm/sec).  The Schmidt Number is
defined as follows:
                                      171

-------
                OH

with both \) and D^ being temperature dependent.  For known conditions of T,
pHg, and £^ values of pH  and corrosion rate ess be calculated.

RANGE OF APPLICATION OF PIPE FLOW MODEL
     The range of application of the pipe flow model is limited  in two
respects.  First, for the model to be valid the corrosion process must be
completely or at least partly controlled by tha rate of solution mass
transport of OH".  The rate expression used in the model  presumes this.
Second, the corroding system must be operating within the range  of values of
pHg, T, and ^ over which data was taken and used in determination of the
empirical relationship for pH .  Each of these constraints exerts some
influence on the overall spectrum of usage but neither turn out  to oe overly
limiting.  The only data found not to be at least partly under rate control
by solution mass transport (Region I), occurred at very high pH  (pH > 8.5).
Under these circumstances, the underlying rate process be it oxide film
growth or an interfacial reaction, completely controls the rate  of corrosion.
At pH values of 8.5 and below the data showed a persistent influence of
solution mass transport of OH".
     The second constraint places limits on pH, T and /  due to  the range of
variation of these parameters  exhibited by the data used ta generate the
empirical relationship for pH .  The regressed  relationship for pH$ is not a
good fit to the data at T = 25°C, 3000 RPM  (oxide film data), and pHB > 7.5
and underestimates pHP by as much as 0.5 pH units at pH^ = 8.5.   At 15°C and
3000 RPM the regressed relationship  for pHg once agalr. underestimates pHs et
pHB > 8.0.  Overall the regressed relationship  for  pHs fits the data reason-
ably well for pHR < 7.5 at all temperatures and values of diffusion layer-
thickness tested.  Data taken was limited to the following range in parameter
values:
                                6.C 1 pH <_ 8.5

                                5 <  T < 25° C
                                       172

-------
                 1.385 x 10-J     1  <*"D  <. 3.375 x 10'^   cm

Since the first constraint was mot, universally at pH < 8.5 the limitations
set by the second constraint are in general the controlling conditions.
These limitations being the range of parameter values shown above modified to
exclude regions of poor goodness of fit of the regressed relationship for
pH$. Care should be taken in interpretation of corrosion rate predictions
under conditions near or beyond these limits.  Extrapclation to pH values
less than 6.0 seems justified since the first constraint is met, but extra-
polation beyond pH = 8.5 is not justified.

RESULTS OF PIPE FLOW MODEL
     Corrosion rate estimates have been calculated using the pipe flow model
for a wide range of temperature, p(-L, and flowrate values.  Some presented
values correspond tn areas outside the range of safe application outlined in
the last section.  Of note, are conditions at high flowrate (Re > 10000) and
high pHg (pH > 8.0).  Here the model predicts corrosion rates that rapidly
approach zero as either pHn or Re is increased, a tendency that is not in
accord with experimental results.  This occurs when the regressed expression
for pH  underestimates its actual value, causing the term:
                                   PHS     pHQ
                                [10    - 10   ]

to be substantially reduced in value and approach zero.  This same effect
occurs when the overall rate is either being significantly influenced by or
completely controlled by the rate of the underlying rate process.  As Re is
increased the transition from solution mass transport rate control to rate
control by the underlying rate process occurs at a lower pHg.  The diffusion
layer thickness produced by a rotating disc electrode at 3000 RPH corresponds
to diffusion layer thicknesses produced in turbulent pipe flow at the follow-
ing Reynolds Numbers:
          Re « 34,500    at    T » 25 °C
          Re * 30,750    at    T = 15°C
          Re • 25,800    at    T •   5°C
                                      173

-------
nu myner- Keynuiub numoers tne transition in rate control oegins to occur at
7.5 _< pHB 1 8.5.
     In calculating rates for presentation in Figures 60 through 64 the pro-
posed model gave some estimates that rapidly approached zero at high Reynolds
Numbers.  When this occurred the values presented are those predicted at the
same pHg and T, but at a lower Re.  These estimates are drawn with broken
lines.  This is a reasonable approximation since an increase in solution mass
transport rate, as signified by an increase in Re, should not decrease the
overall rate but at a minimum allow it to ranain unchanged in the limit where
the rate of the underlying rate process completely controls the overall rate.
In Figure 60 corrosion rate, in mils per year, is plotted verus Log Re at
25°C over a range in flowrate that includes both laminar and turbulent flow.
Corrosion rates estimated at low flowrates (laminar flow regime) range
between 0.50 and 0.20 MPY with' the major rate changes occurring between pH -
5.0 and pi) = 6.0.  At high flow rate (turbulent flow regioie) corrosion rate
estimates range between values greater than 1.0 and 0.2 MPY with significant
rate reductions occurring as pH is increased above 7.5.
     A plot similar to that described above is given in Figure 61 for pipe
flow at 15°C.  Corrosion rate estimate at lew flowrate varied between 0.4 and
0.20 MPY with the major changes occurring between pH = 5.0 and 5.5.  At high
flowrate, corrosion rate estimates range from 0.8 MPY at pH 5-0 to 0.2 MPY st
pH _> 8.0 down slightly from the corresponding rate estimates at 25°C.
     The combined effects of pH and flowrate on the rate cf copper corrosion
at 5°C are shown in Figure 62.  Corrosion rate estimates at low flowrates
range from 0.28 to 0.20 MPY at pH < 5.5 but at higher pHg are effectively
independent of pHD at a value of 0.16 MPY, a slightly lower value than hi en
                 u
pH estimates at 15 and 25°C.  At high flowrate, corrosion rate estimates vary
from 0.80 MPY at pH 5.0 down to 0.20 MPY at pH 3.5.  Once again showing
slightly lower values than corresponding estimates at higher temperatures.
Looking at these three plots cf corrosion rate estimates it is obvious, as
was mentioned above, that the effects of pH and temperature on corrosion rate
are considerably different at low flow rates than at high flowrates.  At low
flowrate (RE < 1000) as shown in Figure 63, there is only a dependence on
pHp at pH < 5.0, and only a minimal temperature dependence.  Above pH = 6.0

                                       174

-------
; en
                 1.00
                 0.£
tit
8-

e   «c O-frO
    <
s   w
©   >
              «!?

              ~fl
          fS

          G
                  S.40
                  0.20
                                           3.000
                                                    3.500


                                               LOQ  RE
                                                                                  4.000
4.500
                       Figure 60,   Corrosion  rate estimates  for 1/2  inch copper  tubino at  varied
                                    flowrate and  25 c.

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1 en
                       2.500
3.000
3.500
                                                                                4.000
                                                                                                   4.500
                                                  LOG RE
                       Figure  61.   Corrosion rate  estimates for 1/2  inch  copper tubing at
                                    varied flowrate and 15 C.

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2.500
3.000
                                      3.SCO
                                                         4.COO
                                                                            4.500
                            LOG  RE
 Figure 62.  Corrosion  rateQestimates for 1/2  inch  copper tubing at varied
             flowrate and 5 c.

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CO
            UJ
0.60





0.50  -





0.40





0.30





0.20





0.10
                                 5'G
                            5.0
                             6.0
7.0
               Figure 63.   _E>'H dependence of corrosion  rates estimated for laminar flow conditions.

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        1.00
        0.80
*  m  °-60
2  >

o  «
oc  i
CE  3;
O      0.40
O



        0.20
               5.0
6.0
                                                     PH
7.0
8.0
              Figure 64.  pH dependence of corrosion rates estimated for turbulent flow
                          conditions.

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corrosion rate estimates are consistently less than 0.25 MPY, ntiere 0.3 MPY
is sometimes considered the maximum desirable corrosion rate for copper in
drinking water.  At Mtjh flcwrates (Re = 50,000) corrosion ratss can increase
dramaticaTy.  Figure 64 is a  plot of corrosion  rate versus pHB at 5, 15, and
25°C and Re = 50,000.  It shows some interesting results.  At low pHB (pHn <
7.0) both flowrate and temperature exert significant influence on predicted
rates.  The combination of low pKg end high temperature give the most unfav-
orable situation with rates increased as much as 500% over rates predicted
under comparable conditions at low flowrate.  This effect is lessened greatly
as pHg is increased to a value above 7.0.   In fact, for pHg > 8.0 the accel-
erating effects of temperature, flowrate, and pHg are essentially eliminated.

MODEL VERIFICATION
     The accuracy with which the  proposed model  predicts corrosion rates
under specified environmental  conditions can only be tested by comparison
with independently measured field data.  Ideally, field data would be avail-
able over the entire  range of  pKp, temperature,  and flowrate desired and the
model could be tested over its entire range of desired use.  Although much
field data exists on  copper corrosion in Tolt River Water, most of it was
taken in the presence of a chlorine residual.  Since chlorination has a big
impact on corrosion  rate (3, 4) but was not considered in the development of
this model, data taken 3t a nonzero chlorine residual is not considered.  A
small amount of field data is  available, at present for limited model veri-
fication.  Data taken in studies  conducted  by the Seattle Water Department
(1, 2) are presented  here and  compared with model predictions.  Corrosion
rates were measured by weight  loss of copper coupons mounted in a pipe flow
test loop.  Since data presented  v.-ere taken at different flot/rates and tem-
perature,some standardization  was required  for comparison.  For each field
datum presented a model prediction corresponding to the same environmental
conditions was calculated.  The ratio of measured rate to predicted rate is
then used as a goodness of fit criteria.  When this ratio equals 1.0 the
model perfectly fits the data. Deviations  from  1.0 are a measure of the
inability of the model to predict measured  values.  Data values along with
predicted model values are presented in Table 28.  Over the range of pH- ccrn-
                                       180

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        Table 28.  Data for Verification of Pipe Flow Model.
       Pipe diem.
T(°C)     (in)
Flow
Re
Corrosion  Corrosion
  Rate       Rate
Measured   Predicted
 (KPY)      (MPY)     a/b   Reference
6.7
6.55
6.7
6.6
6.7
6.7
6.0
6.0
9
9
9
12
12
12
12
12
1.0
1.0
1.0
1.0
i.O
1.0
1.0
1.0
0.45
0.45
0.45
0.25
0.25
0,25
0.25
0.2S
gal /ml si
gal /rain
gal /ml n
ft/sec
ft/ sec
ft/sec
ft/ sec
ft/sec
6927
6927
6927
1760
1760
1760
1760
1760
0.
0.
0.
0.
0.
0.
0.
0.
14
18
18
15
15
14
29
35
0
0
.18
.18
0-18
0
0
0
0
0
.20
.20
.20
.27
.27
0180
1.00
1.00
0.85
0.75
0.70
1.07
1.29
1
1
1
2
2
2
2
1

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pared (6.0 _<. PHg _< 6.7) Figure 65 shows the reasonably good predictions
afforded by the pipe flow model.  Thorough verification of this model, how-
ever, must wait until adequate field data is available for comparison over
the full range of pHg, temperature and flowrates desired.

CONCLUSIONS
     A steady-state pipe flow model for uniform copper corrosion in Tolt
River water has been developed in this chapter.  It is proposed for use in
determining optimum environmental conditions favorable to a reduced rate of
corrosion of copper tubing used for cold water transport of Tolt River water.
The model is developed based on the presumption that mass transport of OH"
away from the corroding surface controls the rate of the overall process, a
presumption that seems well founded in light of results reported in Section
6. Predicted values compared favorably with field data and show explicitly
individual effects of pH, temperature and flowrate on the overall rate of
corrosion.
                                       182

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          1.50
H
CO

          l.CO
      CE
          0.50
                            6.0
6.5
7.0
7.5
               Figure 65.  Comparison of copper  corrosion  rates  predicted  by  pipe  flow
                          model with rates measured  by  independent  sources.

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                                  REFERENCES

SECTION  I

 1.  Economic Effects of Metallic Corrosion in the United  States,  Part  I,  NBS,
     Special Publication 511-1, L.H. Bennett et a1.,  eds. May,  1978.

 2.  Economic Effects of Metallic Corrosion in the United  States,  Part  2,  NBS
     Special Publication 551-2, J.H. Payer et al., eds.  May,  1978.

 3.  Hudson, H.E. and Gilcreas, F.W.  Health and Economic  Aspects  of Water
     Hardness and Carrosiveness, Journal AUWA, 68, 201,  1976=

 4.  Cotruvo, Joseph A.  EPA Policies to Protect the Health of Consumers of
     Drinking Hater in the United States, in Water Supply  and  Health, H. Van
     Lelyveld.  Ed. Elsevier, N.Y., 1981.  p. 345.

 5.  Quality Goals for Potable Water, Journal AWHA.  60,  1317,  1968.

 6.  Singley, J.E.  Principles of Corrosion, in Proceedings of AIWA  Seminar on
     Controlling Corrosion Within Water Systems,, Atlantic  City, NJ,  June 25,
     1978.

 7.  Sussman, S.  Implication of the EPA Proposed National Secondary Drinking
     Hater Regulation on Corrosivity, in Proc. AWHA Seminar on Controlling
     Corrosion Within Hater Systems, Atlantic City,  NJ,  June  25,  1978.

 8.  Courchene, J. and Kirmeyer, 6.   Seattle Internal  Corrosion Control  Plan -
     Summary Report, in Proc. AHWA Seminar on Controlling  Corrosion  Within
     Water Systems, Atlantic City, NJ, June 25, 1978.

 9.  Larson, I.E. and Sollo, F.W.  Loss in Water Main Carrying Capacity,
     Journal AUWA. 59S 1565, 1967.


SECTION II

 1.  Ives, D.J.G. arsd Rawson, A.E.  Copper Corrosion I:  Thennodynanric
     Aspects, J. Electrochem. Society., 109, 447, 1362.

 2.  Ives, DoJ.G. and Rav.'son, A.E.  Copper Corrosion II:   Kinetic  Studies,  J_._
     Electrochan.. loc... 109, 452, 1962.

 3.  Ives, D.J.G. and Rawson, A.E.  Copper Corrosion III:  Electrochemical
     Theory of General Corrosion, J. Electrochgn. Soc.,  109, 450,  1968.

                                      184

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 4.  Ives, D.J.G. and Rawson, A.E.  Copper Corrosion IV:   The  Effect  of  Saline
     Additions, J^ _E1ectrochetn. Soc^. 109. 462,  1962.

 5.  Hoare, J.P.  The Electrochemistry of Oxygen.  Wiley Interscience  1968,
     Chaps. 4 and 9.

 6.  Damjanovic, A.  Mechanistic Analysis of Oxygen Electrode  Reactipnj,  in
     Modern Aspects of Electrochemistry, Vol. 8, 1973.

 7.  Damjanovic, A.  Continued Growth of Anodic  Oxide  Films  on Platinum  and
     the Mechanism and CaUfysis of Oxygen Evolution,  in  Nat.  Bur,  of StdsT
     Spec1 aTTu6TTcation 4o5, ElectrocataTysis on  Non-Metallic Surfaces,  Nov.,
     1976.

 8.  Yeager,. Earnest.  Mechanisms of Electrochemical Reactions on  Non-Metallic
     Surfaces, in National Bureau of Standards Special  Publication 455
     Electrocatalysis on Non-Metallic Surfaces,  Nov. 1976.

 9.  Smyrl, William H.  Electrochemistry and Corrosion on Homogeneous and
     Heterogeneous Metal  Surfaces, in Comprehensive Treatise of Electro-
     chemistry, Vol. 4:  Electrochemical Materials Science,  Plenum Press,
     1981, p.  97.

10.  Fromholds A.T.  Theory of Hetal Oxidation,  Volume 1- Fundamentals,  North
     Holland Publishers,  1976.

11.  Vetter, K.J.  Electrochemical Kinetics:  Theoretical and  Experimental
     Aspects»  Academic Press, 1967=

12.  Frornhold, A.T. and Cook, E.L.  Kinetics of Oxide Film Grovrth  on  Metals:
     Electron Tunnelling and Ionic Diffusion, in Physical^ Review,  153, 600
     (1967).

13.  Mott, N.F.  The Theory of the Formation of Protective Oxide Films on
     Metals - III, Transactions of the Faraday Society, 43^,  p. 429, 1947.

14.  Cabrera,  N. and Mott, N.F.  Theory of the Oxidation of  Metals, Reports  on
     Progress In Physics, 12, p. 1635 1948-9.

15.  Simr.ons, J.G«S "Electric Tunnel Effect Between Dissimilar Electrodes
     Separated by a Thin Insulating Film,"  Journal of Applied Physics,  34,
     2581, 1.963.

16.  GibbSj, D.B.  Anodic Films on Copper- and Silver In Alkaline Solution,
     Ph.D. Thesis, University of  Toronto, 1968.

17.  Simmons, John G.  Generalized Formula for the Electric  Tunnel Effect
     Between  Similar Electrodes Separated by a Think Insulating Film, jj£vnii]_
     of Applied  Physics, 34, 1793, 1963.
                                      185

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18.  Newman, John.  The Fundamental Principles of Current  Distribution and
     Mass Transport in Electrochemical Cells, in Electroanalytlcaj Chemistry,
     Vol. 4, A.J. Bard, ed. , 1958.  Marcel Dekker, Inc.
19.  Pickett, D.d.  jQ^ecbrochercical Reactor Design, Elsevier Press,  1979.
20.  Crank, J.  Mathematics of Diffusion. 2nd Ed., Clarendon Press,  1975.
21.  Levich, V.6.  Physicochemlcal Hydrodynamics, Prentice-Hall .  Inc., 1962.
22.  Denn, M.M.  Process Fluid Mechanics. Prentice-Hall, Inc.. 1980.
23.  Schlichting, H.  Boundary Layer Theory. 6th Ed., MeGraw Hill  Publisher,
     l'J68.
24.  Newman, J.  Electrochemical Systems, Prentice-Hall, Inc., 1973.
25.  Graetz, L.  Ueber die  Warmeleltungsfahigkeit von Flussigkeiten,  Annalen
     der Physik und Chemie. .18, 79, 1883; und 2_5, 337, 1885.
26.  Leveque, M.A.  Les Lois de la Transmission de Chaleur par Coivection,
     Annales des Mines, Memo ires, _12, 201, 1928.
27.  Linton, W.H., Sherwood, T.K.  "Mass  Transfer from Solid Shapes to Water
     in Streamline end Turbulent Flow," Ch em . E n g . Progress , 46_,  p.  258, 1950.
28.  Van Shaw, P., Reiss, L.P., Hanratty, T.J.  "Rates of Turbulent Transfer
     to a Pipe Hall in the  Mass Transfer  Entry Region,"  A.I.Ch.E. Journal , 9_,
     p. 363, 1963.
29.  Chung, B.T.F, and Pang, Yuan.  A Mode)_ _for_ Mass TransjferjT^Tm'bul ent
     Pipe F 1 ovj J-ii t h_ _a_FJ r_s t^ r_der Chern i ca 1 React Ion, Free, of the 1980 "Heat
     Transfer and Fluid Mechanics  Institute, Stanford Uftiv. Press, 1981, p.
     64.
30.  Oavies, J.T.  Turbulence Phenomena,  Academic Press 1972.
31.  Chilton, T.H. and Colburn, A. P.  Mass Transfer  (Absorption) Coefficients.
     Prediction from Data on heat Transfer and Fluid FrictioRe Industrial and
     Engineering ChenJltrjj;, 26, 1183, 1934.
32.  Harriot, P. and HairriKon, R.K.  Che]u_ Em^  Sci^, 200 1973, 1965,
33.  Ad&itis, R.N.  E.^ectrpchemistry  at  Solid  Electrodes. MarceT Dekker,  Inc.
     1969.
34.  Sher-R-ood,  T.K. , Pigford, R.L.,  and Hilke C.R.  Mass Transfer, HcGraw
     Hill,  1975.                                    ~
                                       186

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35.  Soos, 2.G.  Lingane, P.J.  KDerivation of the Chrcnoamperornetric  Constant
     for Unshieloed, Circular, Planar Electrodes", J.  Phys.  Cham.  68,  p.  3321,
     1964.

36.  Lingane, P.J.  "Chronopotentiometry and Chronoamperometry with  Unshielded
     Planar Electrodes."  Ana1. Chem. 36, p. 1723, 1964.

37.  Cornet, I., Bsnington A. E., and Behrsing G.U.  "Effect  of Reynolds  Number
     on Corrosion of Copper By Sulfuric Acid", J. Electrocherc. Soc.  Oct.  1961
     p. 947.                                   	

38.  Frank-Kamenetskeii, D.A.  Diffusion and Heat Transfer in Chemical
     Kinetics, Plenum Press 1959^

39.  Roberts, K.J. Schemilt, L.W. "Strain Effects in the  Corrosion of  Copper
     1n a Flowing Electrolyte", Trans. Inst. Chen. Engr_., 47., T204 (1959).

40.  Zembura, Z.  "Relationship Between Metallic Corrosion and Limiting
     Current Using ths  Rotating Disc Method," Corrosion Science, 8,  p.  703,
     1968.                                    	~        ~

41.  Zembura, Z. and Fulinski, A. "Rotating-D1sk  Investigations of Kinetics of
     Metal Dissolution:  Cfise of Two  Independent Dissolution Reactions",
     E|e(.trochimica Acta. 10, p. 859, 1965.

SECTION JIJ

 1.  Skold, R»V. Larsent T.E.D "Measurement of the Instantaneous Corrosion
     Rate by Means of Polarization Data;i, Corrosion, _1_3_,  69,  1957.

 2.  Uaboian, R. "Electrochemical Techniques for Corrosion," Nat. See,  for
     Corrosjcn jngrs. (NACE), 1977.

 3.  Mansfeld, F.  "Polarization Resistance Technique for Measuring Corrosion
     Currents", Advances in Corrosion Science and Technology, Vol. 6, 1976
     Plenum Press.

 4.  Stern, M, Geary, A.L. "Electrochemical Polarization  I.   A  Theoretics!
     Analysis of the Shape of Polarization  Curves*, J_.. n_ectrocheff!. Soe.,  104,
     p. 56. 1957.

 5.  Barnartt, S. "T«o-Point end Three Point Hethcds for  the Investigation  of
     Electrode Reaction Mechanisms,"  Electrochlniica Actjt _15_e p.  1313,  1970.

 6.  Barnartt,  S.  "Electrochenical  Nature  of Corrosion/ in Electrochemical
     Techniques  for  Corrosion, NACE,  1977.  p.l.

 7.  ASTK 65-71,   Standard Reference Method in Making Poterstiostatlc  and
     potentiodynamic Anodic  Polarization Heafurerents. Part  31, p.  1047, 1971.

 8.  Levich, V.8.  Ph^sicQchemical  Hydrodynamics Prentice-Hall  1962
                                       187

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 9.   SchUchting, H.  Boundary Layer Theory.  6th  Ed. McGraw-Hill 1968

10.   Pleskov, Y.V. and FllinovskH, V.Y.   The Rotating Disc Electrode Con-
     sultants Bureau, Plenum Press 1976.

11.   "Laboratory Corrosion Testing of Metals  for  The Process  Industries", MACE
     Standard TM-01-69 (1976 Revision) National Association of Corrosion
     Engineers 1976.

12.   "Standard Recoroiended Practice for Preparing,  Cleaning,  and Evaluating
     Corrosion Test Specimens", ANSI/ASTM G-l-72  (Reapproved  1974)  Amer. Soc.
     for Testing of Materials, 1979.

13.   "Identification of Corrosion Products on Copper and  Copper Alloys", RACE
     Publication 36159, Nat. Assoc. of Corrosion  Engrs.,  1962.

SECTION IV

 1.   D.A.  Frank-Kamenetskii, Diffusion and Heat Transfer  in Chenical Kiretics,
     2nd Ed.  Plenum Press, 1969.

 2.   Y.G.  Letiich, Physicoc_hCTiicaJ[ Hydrodynamics,,  Prentice-Hall,  1962.

 3.   Y.V.  Pleskov and V.Y, Filir.ovskii, The Rotating Disc F.lectrode,   Plenum
     Press (Consultants' Bureau), 1976.

 4.   Bondart, Michel.  Kinetics of Chemical Processes,  Prentice-Hall,  1968.
     Englewood Cliffs, MJ.

 5.   Kennedy, J.8. and Neville, A.M.   Basic Statistical  Methods  for Engineer.;
     and Scientists, 2nd Ed.,  IEP New  York, 1976.

SECHON V

 1.   Hoyt, Brian P.  "SWD Field Corrosion Tasting 1972-1973 Data Summary"
     Seattle Water Department  Memorandum June 8, 1977.

 2.   Hoyt, Brian P. and Chapman, James D. "Corrosion Characteristics of
     Seattle Water and Evaluation of  Treatment by Lime"; Seattle Water-
     Departments Quality Control Division, Nov.  1972,  Revised Hay 1975.

 3.   Nakhjiri, K.S., Herrera,  C.E., and Hilburn, R.D.   "Counteractive Effects
     of Disinfection and Corrosion Control" Seattle Pistnb:;tpon Svstc-i
     Corrosion Control Study,  Volume V., A report to the njnicTpTTTnviron-
     mental Research Laboratory Cincinatci, Ohio 1982.

 4.  Larson, T.E.  "Corrosion  by Domestic Waters"  Illinois  Stats Water
     Survey, Bulletin 59, 1975.
                                       188

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